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Usage

Uses

Used in Chemical Vapor Deposition (CVD) Applications:
2,4-Dimethanidylpentane, ruthenium is used as a precursor in the metal-organic chemical vapor deposition (MOCVD) process for the growth of ruthenium and ruthenium oxide thin films. It offers advantages such as high purity, low impurities, and excellent film quality, making it suitable for various applications in the electronics and semiconductor industries.
Used in Electronics and Semiconductor Industries:
In the electronics and semiconductor industries, 2,4-dimethanidylpentane, ruthenium is used as a precursor for the growth of ruthenium and ruthenium oxide thin films, which are essential for various applications such as conductive layers, diffusion barriers, and catalysts in devices like solar cells, transistors, and sensors. The use of this volatile ruthenium complex in MOCVD allows for precise control over film thickness and composition, leading to improved device performance and reliability.

Upstream product

• 1000-86-8 2,4-Dimethyl-1,3-pentadiene 
• 20759-14-2 ruthenium(III) chloride hydrate 
• 30066-40-1 {RuCl₂(NCMe)4} 

Relevant academic research and scientific papers

PROCESS FOR PREPARING DIENYL-RUTHENIUM COMPLEXES

The present invention relates to a single-stage process for preparing dienyl-ruthenium complexes of the formula Ru(+II)(dienyl)2, wherein an Ru(II) starting compound of the formula Ru(X)p(Y)q is reacted with a diene ligand in the presence of an inorganic and/or organic base in a single-stage process. Here, polar organic solvents, preferably mixtures of polar organic solvents with water, are used. The dienyl-ruthenium complexes prepared according to the invention are used as precursors for homo-geneous catalysts, for producing functional coatings and for therapeutic applications.

High nucleation density organometallic compounds

This invention relates to high nucleation density organometallic ruthenium compounds. This invention also relates to a process for producing a high nucleation density organometallic ruthenium compound comprising reacting a bis(substituted-pentadienyl)ruthenium compound with a substituted cyclopentadiene compound under reaction conditions sufficient to produce said high nucleation density organometallic ruthenium compound. This invention further relates to a method for producing a film, coating or powder by decomposing a high nucleation density organometallic ruthenium compound precursor, thereby producing the film, coating or powder.

PROCESS FOR PREPARING DIENYL-RUTHENIUM COMPLEXES

The present invention relates to a single-stage process for preparing dienyl- ruthenium complexes of the formula Ru(+II)(dienyl)2, wherein an Ru(II) starting compound of the formula Ru(X)p(Y)q is reacted with a diene ligand in the presence of an inorganic and/or organic base in a single-stage process. Here, polar organic solvents, preferably mixtures of polar organic solvents with water, are used. The dienyl-ruthenium complexes prepared according to the invention are used as precursors for homogeneous catalysts, for producing functional coatings and for therapeutic applications.

Efficient synthesis of ruthenium(II) η5-dienyl compounds starting from Di-μ-chlorodichloro-bis[(1-3η:6-8η)-2,7-dimethyloctadienediyl] diruthenium(IV). Versatile precursors for enantioselective hydrogenation catalysts

The dimeric complex di-μ-chlorodichloro-bis[(1-3η:6-8η)-2,7-dimethyloctadienediyl] diruthenium(IV) in the presence of base reacts with cyclic and acyclic dienes to the corresponding bis(η5-dienyl)ruthenium(II) compounds. Crystalline yellow comp

Synthesis and characterization of bis(pentadienyl)ruthenium compounds

The syntheses of bis(2,4-dimethylpentadienyl)ruthenium and bis(2,3,4-trimethylpentadienyl)ruthenium are reported. Characterization was achieved by using infrared, 1H NMR, 13C NMR, and mass spectroscopy, as well as elemental analysis. In both cases, variable-temperature 1H NMR data reveals an unsymmetric ground state with respective barriers to ligand oscillation of 9.73 and 10.16 kcal/mol. A single-crystal X-ray diffraction study of Ru(2,3,4-C8H13)2 has also been undertaken. The space group is Ci1-P1 (No. 2) with a = 9.213 (4) A, b = 11.486 (4) ?, c = 7.811 (4) ?, α = 101.20 (4)°, β = 114.97 (3)°, γ = 91.89 (3)°, Z = 2, and Dcalcd = 1.46 g/cm3. The final R factor was 0.059 for the 2158 independent observed reflections. Despite the fact that two nearly eclipsing CH3?CH3 interactions result, the complex still adopts the gauche-eclipsed conformation in preference to the anti conformation. The complex is characterized by average Ru-C and C-C bond distances of 2.188 (3) and 1.428 (5) ?, respectively. A number of comparisons are made between these structural data and that of ruthenocene as well as other metal pentadienyl and bis(cyclo-η5-dienyl)metal complexes.