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8,8,8-TRIFLUORO-7-TRIFLUOROMETHYL-OCTANE-1,7-DIOL is a chemical with a specific purpose. Lookchem provides you with multiple data and supplier information of this chemical.

886989-80-6

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886989-80-6 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 886989-80-6 includes 9 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 6 digits, 8,8,6,9,8 and 9 respectively; the second part has 2 digits, 8 and 0 respectively.
Calculate Digit Verification of CAS Registry Number 886989-80:
(8*8)+(7*8)+(6*6)+(5*9)+(4*8)+(3*9)+(2*8)+(1*0)=276
276 % 10 = 6
So 886989-80-6 is a valid CAS Registry Number.

886989-80-6SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 15, 2017

Revision Date: Aug 15, 2017

1.Identification

1.1 GHS Product identifier

Product name 8,8,8-trifluoro-7-(trifluoromethyl)octane-1,7-diol

1.2 Other means of identification

Product number -
Other names 8,8,8-TRIFLUORO-7-TRIFLUOROMETHYL-OCTANE-1,7-DIOL

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:886989-80-6 SDS

886989-80-6Downstream Products

886989-80-6Relevant academic research and scientific papers

NEW HEXAFLUOROALCOHOL-BASED MONOMERS AND PROCESSES OF PREPARATION THEREOF

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Page/Page column 14, (2008/06/13)

The present invention relates to compounds of formula (I): wherein R1 is H, or a C1-C10 linear, branched or cyclic alkyl group which is unsubstituted or substituted with fluorine; R2 is an alicyclic group having 5 to 20 carbon atoms which is unsubstituted or substituted with fluorine; and R3 represents a C1-C10 linear or branched alkylène which is unsubstituted or substituted with fluorine. Processes for preparing such compounds are also disclosed. The compounds of the present invention can be used as monomers in the fields of photolithography and semiconductor fabrication.

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