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Benzene, 1-methoxy-4-[[[(4-methylphenyl)methyl]sulfonyl]methyl]- is a chemical with a specific purpose. Lookchem provides you with multiple data and supplier information of this chemical.

89685-74-5

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89685-74-5 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 89685-74-5 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 8,9,6,8 and 5 respectively; the second part has 2 digits, 7 and 4 respectively.
Calculate Digit Verification of CAS Registry Number 89685-74:
(7*8)+(6*9)+(5*6)+(4*8)+(3*5)+(2*7)+(1*4)=205
205 % 10 = 5
So 89685-74-5 is a valid CAS Registry Number.

89685-74-5SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 17, 2017

Revision Date: Aug 17, 2017

1.Identification

1.1 GHS Product identifier

Product name 1-[(4-methoxyphenyl)methylsulfonylmethyl]-4-methylbenzene

1.2 Other means of identification

Product number -
Other names 4,4'-methoxymethyldibenzyl sulfone

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:89685-74-5 SDS

89685-74-5Upstream product

89685-74-5Relevant academic research and scientific papers

Surface photochemistry: generation of benzyl radical pairs on dry silica gel

Frederick, Bradley,Johnston, Linda J.,Mayo, Paul de,Wong, S. King

, p. 403 - 410 (2007/10/02)

Singlet and triplet benzyl radical pairs have been generated on silica gel by photolysis of a benzyl phenylacetate, a dibenzyl ketone, and a dibenzyl sulfone.The extent of geminate radical recombination has been measured and requires that translational motion of radicals occur on the silica gel surface.This motion was affected by the radical pair multiplicity and the photolysis temperature, but was relatively insensitive to the state of hydration of the silica gel and presence of coadsorbates.The presence of certain rearranged starting materials, which are not formed in solution , amongst the products from photolysis of both dibenzyl ketone and dibenzyl sulfone on silica gel indicates the restrictions on radical movement on the surface on the shorter timescale of the benzyl-phenylacetyl and -benzyl - benzyl sulfonyl radical pairs.

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