915090-37-8 Usage
General Description
TRIPHENYLSULFONIUM 2,3,5,6-TETRAFLUORO-4-(METHACRYLOYLOXY)BENZENESULFONATE is a chemical compound with the molecular formula C23H16F4O4S2P and a molecular weight of 548.50 g/mol. It is a sulfonium salt that is commonly used as a photoinitiator in photocurable materials such as dental composites and coatings. TRIPHENYLSULFONIUM 2,3,5,6-TETRAFLUORO-4-(METHACRYLOYLOXY)BENZENESULFONATE is often added to formulations to enable rapid polymerization upon exposure to light, leading to quick curing times and improved material performance. Additionally, it has been reported to exhibit antimicrobial properties, making it useful in certain biomedical applications. Overall, TRIPHENYLSULFONIUM 2,3,5,6-TETRAFLUORO-4-(METHACRYLOYLOXY)BENZENESULFONATE is a versatile chemical with important applications in various industries.
Check Digit Verification of cas no
The CAS Registry Mumber 915090-37-8 includes 9 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 6 digits, 9,1,5,0,9 and 0 respectively; the second part has 2 digits, 3 and 7 respectively.
Calculate Digit Verification of CAS Registry Number 915090-37:
(8*9)+(7*1)+(6*5)+(5*0)+(4*9)+(3*0)+(2*3)+(1*7)=158
158 % 10 = 8
So 915090-37-8 is a valid CAS Registry Number.
InChI:InChI=1/C18H15S.C10H6F4O5S/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18;1-3(2)10(15)19-8-4(11)6(13)9(20(16,17)18)7(14)5(8)12/h1-15H;1H2,2H3,(H,16,17,18)/q+1;/p-1
915090-37-8Relevant articles and documents
Novel polymeric anionic photoacid generators (PAGs) and corresponding polymers for 193 nm lithography
Wang, Mingxing,Jarnagin, Nathan D.,Lee, Cheng-Tsung,Henderson, Clifford L.,Yueh, Wang,Roberts, Jeanette M.,Gonsalves, Kenneth E.
, p. 3701 - 3707 (2006)
A series of new anionic PAGs, as well as PAG-bound polymers designed for use in 193 nm photoresist materials, have been synthesized and characterized. These novel materials provide optical transparency at 193 nm and also good etch resistance. PAG incorpor
Fluorine-contained photoacid generators (PAGs) and corresponding polymer resists
Wang, Mingxing,Yueh, Wang,Gonsalves, Kenneth E.
, p. 607 - 612 (2008/12/22)
A new series of fluorinated anionic photoacid generators (PAGs) (F4-MBS-TPS, F4VBzBS-TPS, F4-IBBS-TPS, CF3 MBS-TPS, MTFBS-TPS and VBzTFBS-TPS), and corresponding PAG bound polymeric resists (HS-EA-PAG) based on hydroxystyrene (HOST) and 2-ethyl-2-adamanty