939402-96-7Relevant articles and documents
Novel material forming supramolecular structures, process and uses
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Page/Page column 12-13, (2008/12/08)
The invention relates to novel material, forming supramolecular structures below its transition temperature, which contains at least one C=O and/or C=S group and at least one N—H, O—H and/or S—H group and wherein the material has the structure [in-line-formulae]A(—X—B)n ??(1)[/in-line-formulae] wherein A is a cyclic, aromatic and/or aliphatic group, n being a number of 1 to 4, —X—B is, if n is 2, the same or different, and if n is 3 or 4, the same, partly the same or different and has one of the structures (2) to (4) [in-line-formulae]NH—C(Y)—Y—B ??(2)[/in-line-formulae] [in-line-formulae]—NH—C(Y)—NR—B ??(3)[/in-line-formulae] [in-line-formulae]—Y—C(Y)—NR—B ??(4)[/in-line-formulae] with Y being an Oxygen and/or Sulfur atom, B being an organic group with at least one heteroatom, where the heteroatom is bound to at least two carbon atoms when B is linear or cyclic, and where the heteroatom is bound to at least one carbon atom when B is branched, and R being a Hydrogen atom, a cyclic, aromatic and/or aliphatic group or another B group which is the same or different. The material can be made by reacting at least one isocyanate and/or thioisocyanate with at least one amine, alcohol and/or thiol. Typically, the material is used first below its transition temperature, followed by increasing the temperature to around or above the transition temperature, carrying out a process step and subsequently decrease the temperature below the transition temperature.
