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Chengdu Taiyu Industrial Gases Co., Ltd.Oxygen O2//file1.lookchem.com/cas/reactions/2021/06/21/6854918.png

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Oxygen O2 CAS NO.7782-44-7

Min.Order Quantity:
1 Metric Ton
Purity:
99.995%-99.9997%
Port:
Qingdao, Shanghai, Ningbo, Shenzhen, Xianggang, Tianjin
Payment Terms:
L/C,T/T,

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Product Details

Keywords

  • Oxygen O2
  • Industrial Gases
  • China industrial gases

Quick Details

  • ProName: Oxygen O2
  • CasNo: 7782-44-7
  • Application: Industry Use, Medical Use, Semiconduct...
  • DeliveryTime: 20-30 days
  • PackAge: depends
  • Port: Qingdao, Shanghai, Ningbo, Shenzhen, X...
  • ProductionCapacity: Metric Ton/Day
  • Purity: 99.995%-99.9997%
  • LimitNum: 1 Metric Ton
  • Grade: Industrial Grade,Pharma Grade,Electron...

Superiority

cas no.: 7782-44-7
einecs no.: 231-956-9
un no.: un1072
purity: 99.995%-99.9997%
dot class: 2.2
appearance: colorless
grade standard: industrial grade, medical grade, electronic grade.
industry use:
steel making, non-ferrous metal smelting.cutting metal material.
medical use:
in first-aid treatment of emergencies such as suffocation and heart attack, in the treatment of patients with respiratory disorders and in anaesthesia.
semiconductor fabrication:
chemical vapour deposition of silicon dioxide, thermal oxide growth, plasma etching, plasma stripping of photoresist and carrier gas in certain deposition/diffusion operations.

tyhj focuses on industrial gases development, including oxygen, fire extinguishers carbon dioxide, co2, so2, h2, n2.

Details

cas no.: 7782-44-7
einecs no.: 231-956-9
un no.: un1072
purity: 99.995%-99.9997%
dot class: 2.2
appearance: colorless
grade standard: industrial grade, medical grade, electronic grade.
industry use:
steel making, non-ferrous metal smelting.cutting metal material.
medical use:
in first-aid treatment of emergencies such as suffocation and heart attack, in the treatment of patients with respiratory disorders and
in anaesthesia.
semiconductor fabrication:
chemical vapour deposition of silicon dioxide, thermal oxide growth, plasma etching, plasma stripping of photoresist and carrier gas in
certain deposition/diffusion operations.

tyhj focuses on industrial gases development, including oxygen, fire extinguishers carbon dioxide, co2, so2, h2, n2.

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