Nitrogen trifluoride

Base Information

• Chemical Name: Nitrogen trifluoride
• CAS No.: 7783-54-2
• Molecular Formula: F3N
• Molecular Weight: 71.0019
• Hs Code.: 28129011
• European Community (EC) Number: 232-007-1
• ICSC Number: 1234
• UN Number: 2451
• UNII: 4402F4X0RH
• DSSTox Substance ID: DTXSID4040181
• Nikkaji Number: J95.127G
• Wikipedia: Nitrogen trifluoride
• Wikidata: Q413835
• Mol file: 7783-54-2.mol

Synonyms:Nitrogentrifluoride; Perfluoroammonia; Trifluoroamine; Trifluoroammonia

Chemical Property of Nitrogen trifluoride

Chemical Property:

• Appearance/Colour: colorless gas
• Vapor Pressure: 110000mmHg at 25°C
• Melting Point: ?206.8 °C (66.35 K)
• Refractive Index: 1.187
• Boiling Point: -129 ºC
• PSA: 3.24000
• Density: 1.361 g/cm³
• LogP: 0.94190
• Water Solubility.: insoluble
• XLogP3: 1.9
• Hydrogen Bond Donor Count: 0
• Hydrogen Bond Acceptor Count: 4
• Rotatable Bond Count: 0
• Exact Mass: 70.99828349
• Heavy Atom Count: 4
• Complexity: 8
• Transport DOT Label: Non-Flammable Gas Oxidizer

Purity/Quality:

99% ^*data from raw suppliers

NITROGEN TRIFLUORIDE 95.00% ^*data from reagent suppliers

Safty Information:

• Pictogram(s): O
• Hazard Codes: O
• Statements: 8-20
• Safety Statements: 17-23-38

MSDS Files:

SDS file from LookChem

Total 1 MSDS from other Authors

Useful:

• Chemical Classes: Toxic Gases & Vapors -> Other Toxic Gases & Vapors
• Canonical SMILES: N(F)(F)F
• Inhalation Risk: A harmful concentration of this gas in the air will be reached very quickly on loss of containment.
• Effects of Long Term Exposure: The substance may have effects on the liver and kidneys. Repeated or prolonged inhalation may cause fluorosis.
• Description: Nitrogen trifluoride is a colorless gas with little odor. Nitrogen trifluoride is an oxidizer that is thennodynamically stable except at elevated temperatures. At temperatures up to about 482°F (250°C), its reactivity is comparable to oxygen. At higher temperatures, its reactivity is similar to fluorine owing to appreciable dissociation into NF2 and F-. The thennal dissociation of nitrogen trifluoride has been studied by a number of investigators and has been found to peak in the temperature range of 1100K to 1500K. In handling nitrogen trifluoride, conditions should be avoided that can result in high temperatures such as adiabatic compression from the rapid pressurization of a system. Nitrogen trifluoride acts primarily upon the elements as a fluorinating agent, but not a very active one at lower temperatures. At elevated temperatures, nitrogen trifluoride pyrolyzes with many of the elements to produce nitrogen tetrafluoride and the corresponding fluoride. The pyrolysis of nitrogen trifluoride over copper turnings produces nitrogen tetrafluoride in a 62 percent to 71 percent yield at 707°F (375°C). Pyrolysis over carbon is more complete.
• Physical properties: Colorless gas; moldy odor; liquefies at -128.75°C; density of liquid 3.116 g/mL; vapor pressure at -158°C 96 torr; solidifies at -206.8°C; critical temperature -39.15°C; critical pressure 44.02 atm; critical volume 126 cm3/mol; very slightly soluble in water.
• Uses: Nitrogen trifluoride is an etchant and chamber cleaning agent. Oxidizer for high-energy fuels, chemical synthesis. Nitrogen trifluoride is a gas that is made of nitrogen and fluorine atoms. The global electronics industry uses nitrogen trifluoride in its cleaning processes, because the gas outperforms other alternatives, is easier and safer to handle, and helps reduce greenhouse gas emissions. Manufacturers of semiconductors, thin film solar cells and flat-panel displays use nitrogen trifluoride to clean process chambers. Inside the chambers, thin layers of semiconductive and insulating films are applied to wafers and panels. Nitrogen trifluoride removes the residue that these films leave on the chamber walls so the chambers can operate efficiently and produce a quality device. Nitrogen trifluoride offers many benefits over alternative cleaning agents. It is stable at room temperature, so it is relatively easy and safe to handle. It is also easy to use nitrogen trifluoride to form an energetic, or reactive, gas or a plasma—a gas with free electrons. The relatively long life of fluorine radicals made in the plasma makes nitrogen trifluoride an efficient cleaner. Nitrogen trifluoride has been used successfully in large quantities as a fluorine source for high-energy chemical lasers. It is preferred over fluorine because of its comparative ease of handling at ambient conditions. Recently, an increasing amount of nitrogen trifluoride is being used in the semiconductor industry as a dry etchant, showing significantly higher etch rates and selectivities when compared to carbon tetrafluoride and mixtures of carbon tetrafluoride and oxygen. Nitrogen trifluoride was also used as an oxidizer in rocketry in the early 1960s, but this application was not commercialized.

Technology Process of Nitrogen trifluoride

There total 80 articles about Nitrogen trifluoride which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:

Reference yield: 75.0%

(Cl2Te)2N(1+)*GaCl4(1-)=[(Cl2Te)2N]GaCl4 (400090-26-8) + arsenic pentafluoride (7784-36-3) → nitrogen trifluoride (7783-54-2) + [(Cl2Te)2AsF](2+)*[GaCl4](1-)*[AsF6](1-)*AsF5=[(Cl2Te)2AsF][GaCl4][AsF6](AsF5)

Guidance literature:

In liquid sulphur dioxide; Ga-compd.:AsF5 molar ratio was 1:2.5, stirring for 12 h at 20 °C; soln. was concd. in vac., crystn. on cooling, drying for 12 h. in vac. at 20 °C, elem. anal.; NF3 was detected by IR;

DOI:10.1002/1521-3749(200112)627:12<2639::aid-zaac2639>3.0.co;2-v

Reference yield:

ammonium bifluoride → nitrogen trifluoride (7783-54-2) + nitrogen (7727-37-9) + hydrogen (1333-74-0) + ozone (10028-15-6) + dinitrogen monoxide (10024-97-2)

Guidance literature:

In melt; byproducts: O2; Electrolysis; reaction by electrolysis of molten NH4F*HF with a Cu cathode and a graphite anode at 125 °C;;

Reference yield:

hydrogen fluoride (7664-39-3,12381-92-9,32057-09-3,74835-82-8) + hydrazine carboxamide (4426-72-6,51433-48-8,57-56-7) → tetrafluorohydrazine (10036-47-2) + nitrogen trifluoride (7783-54-2) + carbon tetrafluoride (75-73-0) + Carbonyl fluoride (353-50-4)

Guidance literature:

In hydrogen fluoride; byproducts: CO2, N2, C; Electrolysis; 1 M soln. of semicarbazide in anhydrous liquid HF; 5.6-5.7 V; ratio of NF3 : CF4 depends on potential used;

upstream raw materials:

1-fluoroethylene

hydrogen fluoride

urea

tetrafluorohydrazine

Downstream raw materials:

fluorosulfonyl fluoride

thionyl fluoride

sulfur(VI) hexafluoride

dinitrogen trioxide

Refernces

• 1、 Isogai, Tomohiro,Hirooka, Kazuhiro,Tojo, Tetsuro,Takebayashi, Hitoshi,Saito, Morihiro,Inaba, Minoru,Tasaka, Akimasa. "Performances of metal fluoride added carbon anodes with pre-electrolysis for electrolytic synthesis of NF3". . p. 4425 - 4432. Retrieved 2011.
• 2、 Schumb, Walter C.,O'Malley, Robert F.. "The fluorination of nitrides". . p. 922 - 923. Retrieved 1964.
• 3、 -. "Process for fluorinating inorganic or organic compounds by direct fluorination". Paragraph 00273-00274; 0307-0312. . Retrieved 2020/07/14.