Silica gel

Base Information

• Chemical Name: Silica gel
• CAS No.: 112926-00-8
• Molecular Formula: Unspecified
• Molecular Weight: 60.0800018310547
• Mol file: 112926-00-8.mol

Synonyms:Dry Silica Gel;Polyethylenimine-silica;silicon dioxide colloidal;Drying agent free of metal salts,Silica gel;Degussa Aerosil .(R). Silica;silica Aerosil? 200;mesoporous silicate;Silica gel spherical;colloidal anhydrous silica;Sud Chemie KA160 silica spheres;Silica gel for column chromatography;Silica gel;PEI-Silica gel;Drying pearls Orange (heavy metal free);Silica gel PS drying agent;

Chemical Property of Silica gel

Chemical Property:

• Appearance/Colour: white fluffy powder
• Melting Point: 1610°C
• Boiling Point: 2230℃
• Flash Point: 23°C
• PSA: 0.00000
• Density: 2.6
• LogP: 0.00000
• Storage Temp.: 2-8°C
• Water Solubility.: Insoluble in water

Purity/Quality:

98%Min ^*data from raw suppliers

Silica gel 60, for Column chromatography ^*data from reagent suppliers

Safty Information:

• Pictogram(s): R20:吸入有害‖R37
• Hazard Codes: Xi,T,N,Xn
• Statements: 20-37-42/43-49-36/37-48/20-51/53-68-50/53-41-22-60
• Safety Statements: 22-24/25-45-36/37-53-26-36-61-60-39

MSDS Files:

SDS file from LookChem

Total 1 MSDS from other Authors

Useful:

• Uses: Silica gel was used on glass plates for preparative TLC and on aluminium sheets for analytical TLC. Silica gel was used in vacuum chromatography and TLC. Silica gel was used in column chromatography. Silica Gel, 40-63 Micron Particles (cas# 112926-00-8) is a compound useful in organic synthesis. Silica gel was used to compare MCM-41 type mesoporous adsorbents.

Technology Process of Silica gel

There total 767 articles about Silica gel which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:

Reference yield: 25.5%

aluminium carbide (1299-86-1) → aluminum oxide (1333-84-2,1344-28-1) + gibbsite + silica gel (112926-00-8,7631-86-9)

Guidance literature:

at low temp. formed amorphous Al4C3;

Reference yield:

indium(III) oxide + tetrachlorosilane (10026-04-7,53609-55-5) → silica gel (112926-00-8,7631-86-9) + indium(III) chloride (10025-82-8)

Guidance literature:

780-800°C in vac.; Two-fold vacuum sublimation with prior distilling off SiCl4.;

Reference yield:

tetrachlorosilane (10026-04-7,53609-55-5) + neodymium(III) oxide → neodymium trichloride (10024-93-8) + silica gel (112926-00-8,7631-86-9)

Guidance literature:

1000°C in vac.; distilling;

upstream raw materials:

tetrachlorosilane

water

tetramethylorthosilicate

ethenyltrimethylsilane

Downstream raw materials:

caprolactam

2-(hydroxyphenylmethyl)cyclohexan-1-one

4-{4-[3-(1, 3-Dioxo-1, 3-dihydroisoindol-2-yl)-propoxy]-2-methoxy-3,5,6-trimethylbenzoyloxy}-2-methoxy-3,5,6-trimethylbenzoic Acid

2-chloro-2-fluorocyclopropanecarboxylic acid ethyl ester

Refernces

• 1、 Saeki,Narita,Naito. "KINETIC STUDY ON HYDROLYSIS OF SILICON PHOSPHATE IN AQUEOUS ALKALINE SOLUTIONS.". . p. 1591 - 1595. Retrieved 1984.
• 2、 Wang, Gang,Otuonye, Amy N.,Blair, Elizabeth A.,Denton, Kelley,Tao, Zhimin,Asefa, Tewodros. "Functionalized mesoporous materials for adsorption and release of different drug molecules: A comparative study". . p. 1649 - 1660. Retrieved 2009.
• 3、 Chen, Jiann-Ruey,Houng, Mau-Phon,Hsiung, Shen-Kan,Liu, Yuen-Chung. "". . p. 824 - 826. Retrieved 1980.
• 4、 Licoppe, C.,Meriadec, C.,Flicstein, J.,Nissim, Y. I.,Papadopoulo, A. C.. "". . p. 43 - 45. Retrieved 1991.
• 5、 Koganti, Venkat R.,Rankin, Stephen E.. "Synthesis of surfactant-templated silica films with orthogonally aligned hexagonal mesophase". . p. 3279 - 3283. Retrieved 2005.
• 6、 Fuchshuber, H.. "". . p. 93 - 98. Retrieved 1943.
• 7、 Wang, Peng,Chen, Shang-Xing,Zhao, Zhen-Dong,Wang, Zongde,Fan, Guorong. "Synthesis of ordered porous SiO2 with pores on the border between the micropore and mesopore regions using rosin-based quaternary ammonium salt". . p. 11223 - 11228. Retrieved 2015.
• 8、 Ting, Chih-Yuan,Sheu, Hwo-Shuenn,Wu, Wen-Fa,Wan, Ben-Zu. "Porosity effects on properties of mesoporous silica low- k films prepared using tetraethylorthosilicate with different templates". . p. G1-G5. Retrieved 2007.
• 9、 Fujino,Nishimoto,Tokumasu,Maeda. "Silicon dioxide deposition by atmospheric pressure and low-temperature CVD using TEOS and ozone". . p. 2883 - 2887. Retrieved 1990.
• 10、 Fujino,Nishimoto,Tokumasu,Maeda. "Surface modification of base materials for TEOS/O3 atmospheric pressure chemical vapor deposition". . p. 1690 - 1692. Retrieved 1992.