53841-60-4Relevant articles and documents
Oligomer preparation from hexane by radical polyaddition with bis(α-trifluoromethyl-β,β-difluorovinyl) terephthalate
Narita, Tadashi,Hamana, Hiroshi,Hattori, Satoshi
, p. 2340 - 2341 (2004)
Polymer preparation from hexane as a starting material by radical polyaddition with bis(α-trifluoromethyl-β,β-difluorovinyl) terephthalate [CF2=C(CF3)OCOC6H 4COO-C(CF3)=CF2] was investigate
Carbon-carbon bond formation by radical addition of α-trifluoromethylacrylate with cyclic ethers
Hosoya, Akihiro,Umino, Youhei,Narita, Tadashi,Hamana, Hiroshi
, p. 91 - 96 (2008)
The radical addition reactivity of tert-butyl α-trifluoromethylacrylate (CH2{double bond, long}C(CF3)COOC(CH3)3) (BFMA) with cyclic ethers was investigated in order to compare to that of perfluoroisopropenyl ester. One to one addition compound of BFMA with tetrahydrofuran (THF) was produced in fairy high yields in the presence of 2,2′-azobisisobutyronitrile, benzoyl peroxide or di-tert-butyl peroxide to give 2-substituted THF derivative. Time-conversion investigation showed much higher reactivity of BFMA compared to that of 2-benzoxypentafluoropropene [CF2{double bond, long}C(CF3)OCOC6H5]. Radical additions of BFMA with 1,4-dioxane, 1,3-dioxolane and tetrahydropyran were also examined to afford corresponding 1:1 addition products in fairly high yields by achieving carbon-carbon bond formation. It is then concluded that no interconversion of fluoroalkylcarbon radical and hydrocarbon radical may take place in the reaction system of BFMA which possesses two less fluorines in the vinyl group compared to 2-benzoxypentafluoropropene. The method may be a facile way to prepare trifluoromethyl-substituted organic compounds accompanied by the formation of carbon-carbon bonds by the aid of fluorine atoms.
PROCESS FOR PRODUCTION OF FLUORINE-CONTAINING NORBORNENE DERIVATIVES
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Page 101, (2010/02/06)
There are provided a novel norbornene derivative which is a material for a chemically amplifying type photoresist for F2 laser, possesses excellent transparency and improved dry etching resistivity and has a fluorine-containing ketone unit or fluorine-containing tertiary alcohol unit directly bonded to the norbornene backbone; a fluorine-containing polymer obtained by using the norbornene derivative as a copolymerizable monomer; and a chemically amplifying type photoresist composition comprising the fluorine-containing polymer, a photoacid generator and a solvent.