154970-45-3

Basic information

• Product Name: tert-Butyl 5-norbornene-2-carboxylate
• Synonyms: tert-Butyl bicyclo[2.2.1]hept-5-ene-2-carboxylate;tert-Butyl 5-norbornene-2-carboxylate(exo and endo Mixture);5-Norbornene-2-carboxylic acid t-butyl ester;tert-Butyl 5-norbornene-2-carboxylate(exo and endo mixture);tert-Butyl 5-Norbornene-2-carboxylate (endo- and exo- mixture);tert-Butyl 5-Norbornene-2-carboxylate (endo- and exo- mixture);tert-Butyl 5-norbornene-2-carboxylate;5-NORBORNENE-2-CARBOXYLIC T-BUTYL ESTER
• CAS NO: 154970-45-3
• Molecular Formula: C12H18O2
• Molecular Weight: 194.27
• Product Categories: Norbornene Derivatives
• Mol File: 154970-45-3.mol

Chemical Properties

• Boiling Point: 243°C
• Flash Point: 92°C
• Appearance: /
• Density: 1.046
• Vapor Pressure: 0.033mmHg at 25°C
• Refractive Index: 1.4580 to 1.4620
• Storage Temp.: Sealed in dry,Room Temperature
• CAS DataBase Reference: tert-Butyl 5-norbornene-2-carboxylate(CAS DataBase Reference)
• NIST Chemistry Reference: tert-Butyl 5-norbornene-2-carboxylate(154970-45-3)
• EPA Substance Registry System: tert-Butyl 5-norbornene-2-carboxylate(154970-45-3)

Safety Data

• Safety Statements: 24/25
• Hazardous Substances Data: 154970-45-3(Hazardous Substances Data)

Usage

Chemical Properties

White solid

InChI:InChI=1/C12H18O2/c1-12(2,3)14-11(13)10-7-8-4-5-9(10)6-8/h4-5,8-10H,6-7H2,1-3H3

Upstream product

• 75-65-0 tert-butyl alcohol 
• 1663-39-4 tert-Butyl acrylate 
• 542-92-7 cyclopenta-1,3-diene 
• 77-73-6 bi(cyclopentadiene) 

Relevant articles and documents

Oxathiaborolium-Catalyzed Enantioselective [4 + 2] Cycloaddition and Its Application in Lewis Acid Coordinated and Chiral Lewis Acid Catalyzed [4 + 2] Cycloaddition

The nascency of second-generation sulfur-stabilized borenium cations by halophilic Lewis acid SnCl4 leads to highly active chiral Lewis acids that are very effective catalysts for [4 + 2] cycloaddition. Oxathiaborolium pentachlorostannate (5-10 mol %) successfully catalyzed cycloaddition of various dienes and dienophiles to afford cycloadducts with excellent enantioselectivity (20 examples, up to 99% ee). This super Lewis acid also exhibited good enantioselectivity for the first Lewis acid coordinated and chiral Lewis acid catalyzed [4 + 2] cycloaddition to α,β-unsaturated mixed ester amide.

Asymmetric Diels-Alder reaction between acrylates and cyclopentadiene in the presence of chiral catalysts

Asymmetric Diels-Alder reaction between cyclopentadiene and alkyl and cycloalkyl acrylates in the presence of new chiral catalysts, BBr 3?MentOEt, AlCl2OMent, BBr2OMent, and BBr(OMent)2, was studied. Optically active bicyclo[2.2.1]hept-2-ene- 5-carboxylates were synthesized. The influence of the reaction conditions on the total and optical yields and on the stereoselectivity of the adducts synthesized was examined. Nauka/Interperiodica 2006.

Alkyl-substituted tetracyclododecenecarboxylic acid esters, (meth)acrylic acid addition products thereof, and methods for producing the same

The present invention provides alkyl-substituted tetracyclododecenecarboxylic acid esters presented by the general formula (I): wherein R1 is an alkyl group having 1 to 4 carbon atoms and R2 is a hydrocarbon group having 1 to 12 carbon atoms. Further, the represent invention provides (meth)acrylic acid addition products of alkyl-substituted tetracyclododecenecarboxylic acid esters represented by the general formula (II): wherein R1 is an alkyl group having 1 to 4 carbon atoms, R2 is a hydrocarbon group having 1 to 12 carbon atoms, and R3 is a hydrogen atom or a methyl group.

Copolymer resin, preparation thereof, and photoresist using the same

The present invention relates to a copolymer resin for ultra-shortwave light source such as KrF or ArF, process for preparation thereof, and photoresist comprising the same resin. The copolymer resin according to the present invention is easily prepared by conventional radical polymerization due to the introduction of norbornyl(meth)acrylate unit to a structure of copolymer for photoresist. The resin has high transparency at 193 nm wavelength, provides increased etching resistance and enhanced adhesive strength due to a hydrophilic functional group in the norbornyl group, and shows excellent resolution of 0.15 Fm in practical experiment of patterning.