- Cyclopentasilane Si5H10: First single crystal X-ray structure of an oligosilane SixHy and thermal analysis with TG/MS
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Cyclopentasilane Si5H10 (CPS) - a liquid silicon precursor - was crystallized in situ at - 100 C which allowed determination of the single crystal X-ray structure, showing short intermolecular distances below the sum of the v.d.Waals
- Schmidt, Dana,B?hme, Uwe,Seidel, Jürgen,Kroke, Edwin
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- Thermal transformation of solvent-processable organosilicon compounds into inorganic silicone-based thin films
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In this study, a solution-processable precursor, decaphenycyclopentasilane (DPCPS) was synthesized and successfully converted into an inorganic thin film through the heat treatment process. When the DPCPS coating was heat-treated at various temperatures u
- Kim, Sieun,Han, Tai-Hoon,Jung, Hyun-Chul,Oh, Yong-Soo,Pu, Lyongsun,Lee, Pyoung-Chan,Nam, Jae-Do
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- Thermal Synthesis of Perchlorinated Oligosilanes: A Fresh Look at an Old Reaction
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A combined experimental and theoretical study of the high-temperature reaction of SiCl4 and elemental silicon is presented. The nature and reactivity of the product formed upon rapid cooling of the gaseous reaction mixture is investigated by comparison with the defined model compounds cyclo-Si5Cl10, n-Si5Cl12 and n-Si4Cl10. A DFT assessment provides mechanistic insight into the oligosilane formation. Experimental 29Si NMR investigations, supported by quantum-chemical 29Si NMR calculations, consistently show that the reaction product is composed of discrete molecular perchlorinated oligosilanes. Low-temperature chlorination is an unexpectedly selective means for the transformation of cyclosilanes to acyclic species by endocyclic Si?Si bond cleavage, and we provide a mechanistic rationalization for this observation. In contrast to the raw material, the product obtained after low-temperature chlorination represents an efficient source of neo-Si5Cl12 or the amine-stabilized disilene EtMe2N?SiCl2Si(SiCl3)2 through reaction with aliphatic amines.
- Neumeyer, Felix,Schweizer, Julia I.,Meyer, Lioba,Sturm, Alexander G.,Nadj, Andor,Holthausen, Max C.,Auner, Norbert
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supporting information
p. 12399 - 12405
(2017/09/13)
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- Cyclosilane compound, and solution composition and process for forming a silicon film
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Silylcyclopentasilane and a solution composition for forming a silicon film containing the same, which is used for forming a silicon film on the surface of a substrate. There is also disclosed spiro[4.4]nonasilane.
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- Preparation of oligosilanes containing perhalogenated silyl groups (-SiX3, -SiX2-, >SiX-, X = Cl, Br) and their hydrogenation by stannanes
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Starting from methylphenylsubstituted oligosilanes the disilanes SiX3-SiXi,Me3-i (i = 0, 1, 2; X = Cl, Br), trisilanes SiX2(SiXiMe3-i) (i = 0, 1) and branched tetrasilanes SiX(SiXMe2)3 were synthesized and their behavior towards the Lewis-base catalyzed hydrogenation by stannanes was investigated. In the case of methylchlorodisilanes SiCl3-SiCliMe3-i Si-Si bond cleavage competes with the hydrogenation reaction.
- Herzog,Roewer
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p. 217 - 223
(2007/10/03)
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- CONFORMATION OF CYCLIC POLYSILANE IN THE SOLID STATE AS STUDIED BY VARIABLE-TEMPERATURE 29SI CP/MAS NMR
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The 29Si cross-polarization/ magic-angle spinning (CP/MAS) spectra of a cyclic polysilane, decaphenylpentasilane (DPPS), which has a five-membered Si ring puckered in an envelope form (C8 symmetry) and a half-chair form (C2 symmetry)
- Takayama, Toshio,Ando, Shinji,Ando, Isao
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p. 243 - 250
(2007/10/02)
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