18151-53-6

Basic information

• Product Name: THEXYLTRICHLOROSILANE
• Synonyms: THEXYLTRICHLOROSILANE;Trichloro(1,1,2-trimethylpropyl)silane;THEXYLTRICHLOROSILANE: 95&;Trichloro(2,3-dimethyl-2-butyl)silane;Silane, trichloro(1,1,2-trimethylpropyl)-;Trichloro(2,3-dimethyl-2-butyl)silane Trichloro(1,1,2-trimethylpropyl)silane
• CAS NO: 18151-53-6
• Molecular Formula: C6H13Cl3Si
• Molecular Weight: 219.61
• Product Categories: Si (Classes of Silicon Compounds);Si-Cl Compounds;Trichlorosilanes
• Mol File: 18151-53-6.mol

Chemical Properties

• Melting Point: <0
• Boiling Point: 70-72°C 15mm
• Flash Point: 74
• Appearance: /
• Density: 1.16
• Vapor Pressure: 1.39mmHg at 25°C
• Refractive Index: 1.4610 to 1.4650
• CAS DataBase Reference: THEXYLTRICHLOROSILANE(CAS DataBase Reference)
• NIST Chemistry Reference: THEXYLTRICHLOROSILANE(18151-53-6)
• EPA Substance Registry System: THEXYLTRICHLOROSILANE(18151-53-6)

Safety Data

• Statements: 34-36/37/38
• Safety Statements: 26-36/37/39
• RIDADR: 2987
• TSCA: No
• HazardClass: 8
• PackingGroup: II
• Hazardous Substances Data: 18151-53-6(Hazardous Substances Data)

Usage

Uses

Used in Organic Synthesis:
Thexyltrichlorosilane is used as a reagent in organic synthesis for its ability to react with various nucleophiles and undergo chemical reactions such as hydrolysis and condensation. This allows for the formation of a range of silicon-containing compounds, which can be further utilized in the synthesis of various organic compounds.
Used in Silicone Polymer Production:
Thexyltrichlorosilane serves as an important intermediate in the production of silicone polymers. These polymers are widely used in various applications across different industries, including adhesives, sealants, lubricants, and coatings.
Used in Adhesives Industry:
In the adhesives industry, THEXYLTRICHLOROSILANE is used as a building block for silane-based polymers, which contribute to the development of high-performance adhesives with enhanced bonding properties.
Used in Sealants Industry:
In the sealants industry, THEXYLTRICHLOROSILANE is used as a component in the formulation of sealants, providing improved sealing properties and durability.
Used in Lubricants Industry:
In the lubricants industry, THEXYLTRICHLOROSILANE is used as a component in the development of high-performance lubricants, offering better lubrication and wear resistance.
Used in Coatings Industry:
In the coatings industry, THEXYLTRICHLOROSILANE is used as a component in the formulation of coatings, enhancing their protective properties and durability.

InChI:InChI=1/C6H13Cl3Si/c1-5(2)6(3,4)10(7,8)9/h5H,1-4H3

Upstream product

• 563-79-1 2,3-Dimethyl-2-butene 
• 2094-98-6 1,1'-azobis (cyclohexanecarbonitrile) 
• 10025-78-2 trichlorosilane 
• 7664-93-9 sulfuric acid 

Downstream Products

• 217486-36-7 dichlorophenyl(1,1,2-trimethylpropyl)silane 

Relevant articles and documents

Photoreactions of silyliron(II) complexes Cp*Fe(CO)2SiMe3 (Cp* = η5-C5H5, η5-C5Me5) in the presence of trihydrosilanes

The photochemistry of silyliron(II) complexes Cp*Fe(CO)2SiMe3 (Cp* = η5-C5H5, η5-C5Me5) in the presence of trihydrosilanes is described.Three types of products were observed, depending on the bulkiness of the Cp* ligands and the substituents on the trihydrosilanes: (η5-C5H5)Fe(CO)2SiMe3 reacts with tert-alkylsilanes RSiH3 (R = tBu, C(Me2)2H) upon irradiation to give silylene-bridged diiron complexes (η5-C5H5)2Fe2(CO)3(μ-SiHR) in good yields.In contrast, (η5-C5Me5)Fe(CO)2SiMe3 reacts with the tert-alkylsilanes photochemically to give silyl monoiron complexes (η5-C5Me5)Fe(CO)2SiH2R exclusively.Using p-TolSiH3 instead of tert-alkylsilane, the main photolysis product was the hydridobis(silyl)iron complex Cp*Fe(CO)SiMe3(H)SiH2-p-Tol.The X-ray crystal structure analysis of (η5-C5H5)2Fe2(CO)3(μ-SiHtBu) revealed that this complex adopts a geometry in which the two Cp rings and a Si-H bond are located on the same side with respect to the SiFe2C four-membered ring 29Si NMR spectra of the silylene-bridged diiron complexes showed signals at remarkably low field (δ 235.5-289.1 ppm).A mechanism for the formation of these silylene-bridged diiron complexes is proposed.

Photoinduced Direct Synthesis of Silylene-Bridged Dinuclear Iron Complexes5-C5H5)2Fe2(CO)2(μ-CO)(μ-SiHR)> from 5-C5H5)Fe(CO)2SiMe3> and RSiH3 (R=t-Bu, (CMe2)2H)

Photolysis of (Cp=η5-C5H5) in the presence of RSiH3 (R=t-Bu, (CMe2)2H) afforded silylene-bridged dinuclear complexes .The structure of the complex was determined by X-ra

Tertiary alkylsilane

A novel tertiary alkylsilane is disclosed, which is useful as a variety of starting materials such as for photoreactive materials including semiconductor materials, insulative materials and photoresists, polymerization initiators and silicone-based ceramics precursors and is contributive to the safe and efficient production of high grade semiconductors.