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Aluminum phosphide is a binary salt, a dark gray or dry, yellow crystalline solid that reacts with moisture to produce phosphine, a flammable and poisonous gas. It is a dangerous fire risk and has a specific gravity of 2.85, which is heavier than water. The compound is composed of gray or dark yellow crystals and is known for its specific hazard of giving off poisonous and pyrophoric phosphine gas when in contact with moist air, water, or steam. It also ignites spontaneously upon contact with air.

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  • 20859-73-8 Structure
  • Basic information

    1. Product Name: Aluminum phosphide
    2. Synonyms: alminiumphosphide;al-phos;aluminiumfosfide;aluminiumphosphide(alp);aluminiumphosphidetablet;Aluminum phosphide (AlP);aluminumphosphide(alp);celphide
    3. CAS NO:20859-73-8
    4. Molecular Formula: AlP
    5. Molecular Weight: 57.96
    6. EINECS: 244-088-0
    7. Product Categories: INSECTICIDE
    8. Mol File: 20859-73-8.mol
  • Chemical Properties

    1. Melting Point: 2000℃
    2. Boiling Point: N/A
    3. Flash Point: N/A
    4. Appearance: /green or yellow cubic crystals
    5. Density: 2.42
    6. Refractive Index: N/A
    7. Storage Temp.: N/A
    8. Solubility: N/A
    9. Water Solubility: reacts with H2O to produce phosphine [MER06]
    10. Stability: Flammable solid. Contact with acids liberates highly toxic gas (phosphine). Incompatible with acids, moisture, oxidizing agents.
    11. CAS DataBase Reference: Aluminum phosphide(CAS DataBase Reference)
    12. NIST Chemistry Reference: Aluminum phosphide(20859-73-8)
    13. EPA Substance Registry System: Aluminum phosphide(20859-73-8)
  • Safety Data

    1. Hazard Codes: F,T+,N
    2. Statements: 15/29-28-32-50
    3. Safety Statements: 3/9/14-30-36/37-45-61
    4. RIDADR: 1397
    5. WGK Germany:
    6. RTECS:
    7. HazardClass: 4.3
    8. PackingGroup: I
    9. Hazardous Substances Data: 20859-73-8(Hazardous Substances Data)

20859-73-8 Usage

Uses

1. Agricultural Uses:
Aluminum phosphide is used as a fumigant, fungicide, rodenticide, and insecticide for various crops. It is employed as an insecticidal fumigant for grain, peanuts, processed food, animal feed, leaf tobacco, cottonseed, and as a space fumigant for flour mills, warehouses, and railcars. It is also used in baits for rodent and mole control in crops.
2. Source of Phosphine:
Aluminum phosphide is used as a source of phosphine in semiconductor research.
3. Fumigant:
It is used as a fumigant to control insects and rodents in both food and nonfood crops in indoor environments. It is also used in the control of rodents outdoors via application to their burrows or in grain storage areas.
4. Semiconductor Technology:
Aluminum phosphide is utilized in semiconductor technology due to its chemical properties and reactions.
5. Pesticide (RUP):
It is a U.S. EPA restricted Use Pesticide (RUP) and is often mixed with bait food such as cornmeal, which can be a danger to pets and children. When phosphides are ingested or exposed to moisture, they release phosphine gas.
6. Brand Names and Marketing:
Aluminum phosphide is marketed under various brand names such as Celphos, Alphos, Quickphos, Phosfume, Phostoxin, Talunex, Degesch, Synfume, Chemfume, Phostek, and Delicia. It is available in solid form as a tablet, pellet, or dust and is packaged in porous bags or blister packs.
7. NFPA 704 Designation:
The NFPA 704 designation for aluminum phosphide is health 4, flammability 4, and reactivity 2. The white section at the bottom of the diamond has a W with a slash through it, indicating water reactivity.

Air & Water Reactions

Decomposed by water or moist air, evolving phosphine, a toxic gas that often ignites [Merck 11th ed. 1989].

Reactivity Profile

Aluminum phosphide is a reducing agent. Contact with mineral acids causes explosive evolution of toxic phosphine [Wang, C. C. et al., J. Inorg. Nucl. Chem., 1963, 25, p. 327]. Heating produces highly toxic fumes of phosphorus oxides. Can react vigorously upon contact with oxidizing agents. [Sax, 9th ed., p. 119].

Hazard

Dangerous fire risk. It evolves phosphine.

Health Hazard

Acute toxicity occurs primarily by the inhalation route when Aluminum phosphide decomposes into the toxic gas, phosphine. The human median lethal dose for Aluminum phosphide has been reported to be 20 mg/kg. Rated as super toxic: probable oral lethal dose is less than 5 mg/kg or less than 7 drops for a 70 kg (150 lb.) person.

Fire Hazard

Releases toxic fumes on exposure to moist air, water, or acids. Decomposes to produce phosphine gas. Avoid water, dilute mineral acids, dilute or concentrated hydrochloric acid. Stable when dry. Avoid moist air.

Trade name

AL-PHOS?; CELPHIDE?; CELPHOS?; DELICIA?; DETIA?; DETIA-EX-B?; DETIA GAS EX?; DETIA-GAS-EX-B?; DELICIA GASTOXIN; FARMOZ?; FUMITOXIN?; PHOSTOXIN?; PHOSTOXIN-A?; QUICKPHOS?; QUICK TOX?; RENTOKIL GASTION?

Safety Profile

A human poison by inhalation and ingestion. Dangerous; in contact with water, steam, or alkali it slowly yields PH3, which is spontaneously flammable in air. Explosive reaction on contact with mineral acids produces phosphine. When heated to decomposition it yields toxic PO,. See also ALUMINUM COMPOUNDS, PHOSPHIDES, and PHOSPHINE. AHGOOO

Potential Exposure

Used as a rodenticide; wood preservative; as a source of phosphine; as an insecticidal fumigant for grain, peanuts, processed food, animal feed, leaf tobacco, cottonseed; and as space fumigant for flour mills, warehouses and railcars. Used in semiconductor research

Environmental Fate

Phosphine is known to bind to and inhibit cytochrome oxidase and changes the valence of the hem component of hemoglobin. Oxidative stress is one of the main mechanisms of action of AlP toxicity, which boosts extramitochondrial release of free oxygen radicals resulting in lipid peroxidation and protein denaturation of the cell membrane in various organs. Furthermore, AlP reduces glutathione, which is one of the main antioxidant defenses. AlP causes toxic stress, accompanied by changes in glucose metabolism. It also disrupts protein synthesis and enzymatic activity, particularly in the lung and heart cell mitochondria, which leads to blockage of the mitochondrial electron transport chain. Phosphine may cause denaturing of various enzymes; it is involved in cellular respiration and metabolism, and may be responsible for denaturation of the oxyhemoglobin molecule.

Shipping

UN1397 Aluminum phosphide, Hazard Class: 4.3; Labels: 4.3-Dangerous when wet material, 6.1-Poisonous materials.

Toxicity evaluation

Once exposed to water or in the presence of high ambient humidity, AlP generates phosphine gas. Therefore, atmospheric dissipation is expected to be the primary fate process for phosphine. In addition to phosphine being generated from the reaction of AlP with water, the other reaction product is aluminum hydroxide, a common constituent of clay. If the liberated phosphine (PH3) burns, it will produce phosphorus pentoxide (P2O5), which forms orthophosphoric acid (H3PO4) when exposed to water.

Incompatibilities

Able to ignite spontaneously in moist air; forms toxic and explosive phosphine gas on contact with moisture in air. Reacts violently with water, steam, carbon dioxide; acids, alcohols, and foam fire extinguishers. Contact with water and bases slowly releases highly flammable and toxic phosphine gas.

Waste Disposal

Consult with environmental regulatory agencies for guidance on acceptable disposal practices. Generators of waste containing this contaminant (≥100 kg/mo) must conform with EPA regulations governing storage, transportation, treatment, and waste disposal. Allow to react slowly with moisture in the open, being sure that phosphine gas evolved is dissipated. Alternatively, mix with dry diluent and incinerate at temperature above 1000 C with effluent gas scrubbing. In accordance with 40CFR165, follow recommendations for the disposal of pesticides and pesticide containers. Must be disposed of properly by following package label directions or bycontacting your local or federal environmental control agency, or by contacting your regional EPA office.

Check Digit Verification of cas no

The CAS Registry Mumber 20859-73-8 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 2,0,8,5 and 9 respectively; the second part has 2 digits, 7 and 3 respectively.
Calculate Digit Verification of CAS Registry Number 20859-73:
(7*2)+(6*0)+(5*8)+(4*5)+(3*9)+(2*7)+(1*3)=118
118 % 10 = 8
So 20859-73-8 is a valid CAS Registry Number.
InChI:InChI=1/Al.P/q+3;-3

20859-73-8SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 13, 2017

Revision Date: Aug 13, 2017

1.Identification

1.1 GHS Product identifier

Product name aluminium phosphide

1.2 Other means of identification

Product number -
Other names aluminum phosphide

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:20859-73-8 SDS

20859-73-8Downstream Products

20859-73-8Relevant articles and documents

In Search of Aluminum Hexathiohypodiphosphate: Synthesis and Structures of ht-AlPS4, lt-AlPS4, and Al4(P2S6)3

Kuhn, Alexander,Eger, Roland,Ganter, Pirmin,Duppel, Viola,Nuss, Jürgen,Lotsch, Bettina V.

, p. 2663 - 2668 (2016/02/23)

We report the high-pressure synthesis and the structure of aluminum hexathiohypodiphosphate, Al4(P2S6)3, along with the redetermination of the structures of two modifications of AlPS4. Al4(P2S6)3 crystallizes in the monoclinic space group C2 with a = 17.584(3), b = 10.156(2), c = 6.698(1) ?, β = 106.93(1) in a superstructure of the layered FePS3 structure type with tripled a axis. Hereby, Al3+ occupies 2/3 of the Fe2+ sites in an ordered fashion. The structure model obtained from single-crystal X-ray diffraction was corroborated by TEM-PED. The low-temperature modification of AlPS4 with platelet-like morphology shows tetragonal symmetry [space group P bar42c, a = b = 5.6572(9), c = 9.220(2) ?]. The orthorhombic high-temperature modification with fibrous needle-like morphology of AlPS4 is isotpyic with BPS4 [space group I222, a = 5.660(2), b = 5.759(2), c = 9.189(2) ?].

The phase transition of ZrP induced by Si in Al-Si melts

Bao, Guoju,Li, Dakui,Nie, Jinfeng,Liu, Xiangfa

, p. 45 - 50 (2012/06/30)

In this article, the reaction process of ZrP in Al-Si melts was investigated, and by the results of XRD, EDS and FESEM, the AlP and (Al, Zr, Si) phases were observed, indicating that the phase transition of ZrP phase has carried out in Al melts induced by Si. Detailed investigation confirmed that the finer particle of (Al, Zr, Si) phase is the type of ZrAl3 doped with trace Si and the coarser block is the type of ZrSi2 doped with trace Al. Furthermore, it is found that when the ZrP phase was added into Al-Si melts, Si atoms accumulated around ZrP phase, forming Si deficiency-layer and Si enrichment-layer. The concentration gradient of Si leads to two types of transition process of the ZrP phase in Al melt. Finally, the reaction mechanism of ZrP with Al-Si alloys was analyzed.

Preparation of Al, Cr, Nb, Mo, and W monophosphides from a lithium metaphosphate melt

Lesnyak,Stratiichuk,Sudavtsova,Slobodyanik

, p. 1274 - 1277 (2007/10/03)

Synthesis of a series of phosphides (AlP, CrP, NbP, MoP, and WP) by reactions of powdered metals with a melt of lithium metaphosphate LiPO3 was studied. Thermodynamic parameters (ΔH2980, ΔS2980, ΔG2980, and ΔG12730) of the reactions were calculated and their temperature modes were optimized on the basis of the standard thermodynamic characteristics of the initial substances and the reaction products. X-ray patterns of the powders of the obtained compounds are presented.

Electrical Discharge-Assisted Production of a bcc Aluminum Phosphide Phase

Rybachenko,Kazbanov,Trofimov,Olado

, p. 481 - 484 (2008/10/08)

A bcc aluminum phosphide phase was produced with the assistance of a low-power spark discharge. This phase is isostructural to high-pressure Si(II) (which exists under pressures above 20 GPa). X-ray powder diffraction, gravimetric, and chemical analysis evidence concerning samples dissolved in HCl and NaOH and thermally oxidized is reported. The silicon, iron, and nickel concentrations found by emission spectroscopy are also reported.

Reactions of H3Al-NMe3 with E(SiMe3)3 (E = P, As). Structural Characterization of the Trimer [H2AIP(SiMe3)2]3 and Base-Stabilized Adduct [H2AIAs(SiMe3)2]-NMe3 and Their Thermal Decomposition toward Nanocrystalline AIP and AIAs, Respectively

Janik, Jerzy F.,Wells, Richard L.,White, Peter S.

, p. 3561 - 3566 (2008/10/08)

Dehydrosilylation reactions in diethyl ether between H3Al-NMe3 and E(SiMe3)3 afforded for E = P a high yield of the trimer [H2AlP(SiMe3)2]3 (1), while for E = As a monomeric base-stabilized adduct [H2AlAs(SiMe3)2]NMe3 (2) as well as its degradation solid product were obtained. No reaction occurred for E = N. The singlecrystal X-ray structure determination for 1 yielded a planar six-membered ring of alternating four-coordinated Al and P centers. The structural solution for 2 revealed the monomeric unit [H2AlAs(SiMe3)2] stabilized by coordination of NMe3 at the Al site. Pyrolysis of 1 at 450 °C promoted further dehydrosilylation and yielded a product which by XRD spectroscopy showed the onset of AlP crystallinity while at 950 °C afforded nanocrystalline AlP with 5 nm average panicle size. Pyrolysis of 2 at 450 °C resulted in the formation of nanocrystalline AlAs with 2 nm average particle size. Under applied pyrolysis conditions for 1 and 2, the target elimination-condensation pathway via dehydrosilylation was accompanied by other decomposition side reactions and retention of some contaminant residues.

Synthesis of III-V semiconductors by solid-state metathesis

Treece, Randolph E.,Macala, Gerald S.,Rao, Lin,Franke, Deanna,Eckert, Hellmut,Kaner, Richard B.

, p. 2745 - 2752 (2008/10/08)

Solid-state precursor reactions have been investigated as a general synthetic route to binary III-V (13-15) compounds. The generic reaction scheme MX3 + Na3Pn → MPn + 3 NaX (M = Al, Ga, In; X = F, Cl, I; Pn = pnictogen = P, As, Sb) has been used to prepare crystalline powders of the III-V semiconductors. The reaction mixtures can be either heated in sealed tubes or ignited with a hot filament, and the byproduct salts are simply removed by washing with an appropriate solvent. The ignited reactions are self-propagating and highly exothermic, owing to the formation of 3 mol of sodium halide. Products from both types of reactions have been characterized by powder X-ray diffraction, scanning electron microscopy, energy dispersive spectroscopy, and solid-state NMR. In some cases, the products of the ignited solid-state metathesis (SSM) reactions differ from those of the sustained heating reactions. These differences provide clues as to reaction pathways in the solid-state precursor reactions.

Synthesis and characterization of phosphinosilylalanes from [(CH3)3Si]3Al. Crystal and molecular structure determinations of {[(CH3)3Si]2AlP(C6H 5)2}2, {[(CH3)3Si]2AlP(C6H 5)[Si(CH ...

Janik, Jerzy F.,Duesler, Eileen N.,McNamara, William F.,Westerhausen, Matthius,Paine, Robert T.

, p. 506 - 514 (2008/10/08)

Full title: Synthesis and characterization of phosphinosilylalanes from [(CH3)3Si]3Al. Crystal and molecular structure determinations of {[(CH3)3Si]2AlP(C6H 5)2}2, {[(CH3)3Si]2AlP(C6H 5)[Si(CH3)3]}2, {[(CH3)3Si]2AlP(H)(c-C6H 11)}3, and [{[(CH3)3Si]2N}(C6H 5)P]2. The reactions of [(CH3)3Si]3Al·O(C2H 5)2 with phosphines (C6H5)2PCl, PCl3, {[(CH3)3Si]2N}(C6H5)PCl, (C6H5)2PH, [(CH3)3Si](C6H5)PH, (C6H5){[(CH3)3Si]2N}PH, (C-C6H11)PH2, and PH3 were surveyed. Reactions of the chlorophosphines led to formation of di- or polyphosphines, and the molecular structure of [{[(C-H3)3Si]2N}(C6H 5)P]2 was determined by single-crystal X-ray diffraction analysis. The compound crystallized in the tetragonal space group I41/a with a = 24.379 (9) A?, c = 10.778 (3) A?, Z = 8, V = 6405.8(4) A?, and ρcalcd = 1.11 g cm-3. Least-squares refinement gave RF = 6.3% and RwF = 5.3% on 1613 reflections with F ≥ 4σ(F). The diphosphine has C1 symmetry, and each phosphorus atom has pseudotetrahedral geometry: P-P = 2.270 (3) A? and P-N = 1.724 (4) A?. The remaining phosphines form Lewis acid-base complexes with [(CH3)3Si]3Al and/or undergo elimination/condensation chemistry resulting in production of phosphinoalane ring compounds or polymers. The molecular structures of three additional compounds have been determined by single-crystal X-ray diffraction analysis. The compound {[(CH3)3Si]2AlP(C6H 5)2}2 crystallized in the triclinic space group P1 (No. 2) with a = 10.989 (3) A?, 6 = 20.576 (5) A?, c = 21.000 (5) A?, α = 101.52 (2)°, β = 102.17 (2)°, γ = 100.86 (2)°, Z = 4, V = 4414 (2) A?3, and ρcalcd = 1.08 g cm-3. Least-squares refinement gave RF = 11.3% and RwF = 9.6% on 7466 reflections with F > 3σ(F). The compound {[(CH3)3Si]2AlP(C6H 5)[Si(CH3)3]}2 crystallized in the monoclinic space group P21/n with a = 11.360 (8) A?, b = 12.215 (7) A?, c = 16.673 (12) A?, β = 102.13 (5)°, Z = 2, V = 2261 (2) A?3, and ρcalcd = 1.04 g cm-3. Least-squares refinement gave RF = 9.9% and RwF = 7.7% on 2718 reflections with F ≥ 3σ(F). The compound {[(CH3)3Si]2AlP(H)(c-C6H 11)}3 crystallized in the triclinic space group P1 (No. 2) with a = 12.564 (2) A?, b = 12.935 (3) A?, c = 19.149 (4) A?, α = 83.66 (2)°, β = 88.64 (2)°, γ = 66.65 (1)°, Z = 2, V = 2839 (1) A?3, and ρcalcd = 1.01 g cm-3. Least-squares refinement gave RF = 11.3% and RwF = 8.6% and 5213 reflections with F ≥ 3σ(F). The first two compounds contain planar four-membered (ALP)2 rings with C1 symmetry and average Al-P distances of 2.455 and 2.466 A?, respectively. The third compound forms a six-membered skew-boat cyclohexane-like (AlP)3 ring with an E, E, A conformation and an average Al-P distance of 2.444 A?. Pyrolysis of a polymeric product obtained from reactions involving PH3 and [(C-H3)3Si]3Al·O(C2H 5)2 resulted in formation of aluminum phosphide, AlP.

Organometallic Chemical Vapor Deposition of III/V Compounds Semiconductors with Novel Organometallic Precursors

Cowley, Alan H.,Benac, Brian L.,Ekerdt, John G.,Jones, Richard A.,Kidd, Kenneth B.,et al.

, p. 6248 - 6249 (2007/10/02)

We have found that compounds of type 1 are excellent single source precursors for the preparation of III/V compound semiconductor materials such as GaAs and InP under relatively mild conditions.

SYNTHESIS AND REACTIVITY OF METALLOPHOSPHANES

Paine, Robert T.,McNamara, William F.,Janik, Jerzy Fr.,Duesler, Eileen N.

, p. 241 - 244 (2007/10/02)

Aspects of the reactivity of metallophosphanes are presented along with the synthesis and structure determinations for new aluminophosphanes.

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