22398-99-8 Usage
Uses
Used in Semiconductor Industry:
Indium phosphide is used as a semiconductor material for its electronic grade properties, making it suitable for various applications in the semiconductor industry.
Used in Optoelectronics Industry:
Indium phosphide is used as a material for injection lasers due to its optoelectronic properties, which allow for the efficient generation of laser light.
Used in Renewable Energy Industry:
Indium phosphide is used as an experimental material for solar cells, leveraging its semiconductor properties to improve the efficiency of solar energy conversion.
Hazard
Probable carcinogen. See indium.
Check Digit Verification of cas no
The CAS Registry Mumber 22398-99-8 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 2,2,3,9 and 8 respectively; the second part has 2 digits, 9 and 9 respectively.
Calculate Digit Verification of CAS Registry Number 22398-99:
(7*2)+(6*2)+(5*3)+(4*9)+(3*8)+(2*9)+(1*9)=128
128 % 10 = 8
So 22398-99-8 is a valid CAS Registry Number.
22398-99-8Relevant articles and documents
Reactions of trifluoromethylthiocopper with halomethanes
Munavalli,Rossman,Rohrbaugh,Ferguson,Durst
, p. 7 - 13 (2007/10/03)
The reaction of trifluoromethylthiocopper with halomethanes, namely di-and triiodo-, dibromodichloro-, dibromochlorofluoro-, dibromo-difluoro-, bromochlorofluoro-, phenyltrichloro-, bromocyano-and dibromofluoro-methanes, has been investigated in detail. In addition to the expected compounds, the formation of unusual products such as bis (trifluoromethyl) trithiocarbonate, dimethyl (trifluoromethylthio) benzene, bis (trifluoromethylthio) fluoromethane, (trifluoromethylthio) carbonyl fluoride, carbon disulfide, carbon tetrachloride, trifluoromethylthio-benzoate, etc. was observed. In some cases, bis (trifluoromethylthio) mercury has been used instead of trifluoromethylthiocopper. The mechanism of formation of the various products and their mass spectral fragmentation behavior are described.