- PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
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A photoacid generator having formula (1a) is provided. A chemically amplified resist composition comprising the PAG forms a pattern of rectangular profile with a good balance of sensitivity and LWR when processed by photolithography using ArF excimer lase
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Paragraph 0220-0221
(2020/02/22)
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- REACTION OF SULFUR HALIDES WITH UNSATURATED COMPOUNDS XV. 2,2'-DICHLORO SULFIDES IN REACTION WITH ORGANOALUMINUM COMPOUNDS
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The reaction of 2,2'-dichloro sulfides with organoaluminum compounds was investigated.The reaction leads to dechlorination or alkylation products, depending on the structure of the organoaluminum compounds.It was established that nickel, titanium, and zirconium compounds have catalytic activity and enabled the reactions to occur under milder conditions.The addition of sulfur dichloride to 1-methyl- and 1,5-dimethyl-1,5-cyclooctadienes was investigated, and the rearrangement was followed in the series of 9-thiabicyclononane derivatives.
- Tolstikov, G. A.,Kantyukova, R. G.,Spirikhin, L. V.
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p. 1210 - 1218
(2007/10/02)
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