Welcome to LookChem.com Sign In|Join Free

CAS

  • or
4,4-dimethyl-1-(trimethylsilyl)pentane-1,3-dione is a chemical with a specific purpose. Lookchem provides you with multiple data and supplier information of this chemical.

286854-89-5 Suppliers

Post Buying Request

Recommended suppliersmore

  • Product
  • FOB Price
  • Min.Order
  • Supply Ability
  • Supplier
  • Contact Supplier
  • 286854-89-5 Structure
  • Basic information

    1. Product Name: 4,4-dimethyl-1-(trimethylsilyl)pentane-1,3-dione
    2. Synonyms: 4,4-dimethyl-1-(trimethylsilyl)pentane-1,3-dione
    3. CAS NO:286854-89-5
    4. Molecular Formula: C10H20O2Si
    5. Molecular Weight: 0
    6. EINECS: N/A
    7. Product Categories: N/A
    8. Mol File: 286854-89-5.mol
  • Chemical Properties

    1. Melting Point: N/A
    2. Boiling Point: N/A
    3. Flash Point: N/A
    4. Appearance: /
    5. Density: N/A
    6. Refractive Index: N/A
    7. Storage Temp.: N/A
    8. Solubility: N/A
    9. CAS DataBase Reference: 4,4-dimethyl-1-(trimethylsilyl)pentane-1,3-dione(CAS DataBase Reference)
    10. NIST Chemistry Reference: 4,4-dimethyl-1-(trimethylsilyl)pentane-1,3-dione(286854-89-5)
    11. EPA Substance Registry System: 4,4-dimethyl-1-(trimethylsilyl)pentane-1,3-dione(286854-89-5)
  • Safety Data

    1. Hazard Codes: N/A
    2. Statements: N/A
    3. Safety Statements: N/A
    4. WGK Germany:
    5. RTECS:
    6. HazardClass: N/A
    7. PackingGroup: N/A
    8. Hazardous Substances Data: 286854-89-5(Hazardous Substances Data)

286854-89-5 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 286854-89-5 includes 9 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 6 digits, 2,8,6,8,5 and 4 respectively; the second part has 2 digits, 8 and 9 respectively.
Calculate Digit Verification of CAS Registry Number 286854-89:
(8*2)+(7*8)+(6*6)+(5*8)+(4*5)+(3*4)+(2*8)+(1*9)=205
205 % 10 = 5
So 286854-89-5 is a valid CAS Registry Number.

286854-89-5SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 19, 2017

Revision Date: Aug 19, 2017

1.Identification

1.1 GHS Product identifier

Product name 4,4-dimethyl-1-trimethylsilylpentane-1,3-dione

1.2 Other means of identification

Product number -
Other names 2,2,6,6-tetramethyl-2-silaoctane-3,5-dione

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:286854-89-5 SDS

286854-89-5Relevant articles and documents

Facile synthesis of a novel class of organometalloid-containing ligands, the sila-β-diketones: Preparation and physical and structural characterization of the copper(II) complexes, Cu[R′C(O)CHC(O)SiR3]2

Banger, Kulbinder K.,Ngo, Silvana C.,Higashiya, Seiichiro,Claessen, Rolf U.,Bousman, Kenneth S.,Lim, Poay N.,Toscano, Paul J.,Welch, John T.

, p. 15 - 32 (2003)

The substitution of a carbon atom by silicon provides an attractive, novel approach to modification of the thermal stability and volatility of metal-organic chemical vapor deposition precursors supported by β-diketonate ancillary ligands. The low temperature reaction of the lithium enolates of acetyltrialkylsilanes with acyl chlorides affords the sila-β-diketones, R′C(O)CH2C(O)SiR3 (R′=Me, Et, n-Pr, i-Pr, n-Bu, i-Bu, s-Bu, t-Bu; SiR3=SiMe3, SiEt3, SiMe2(t-Bu), SiMe2(t-hexyl), Si(i-Pr)3), in good yields. Multinuclear NMR studies suggest that the sila-β-diketones exist as the enolic tautomer with a vinylsilane isomeric structure. Homoleptic Cu(II) sila-β-diketonate complexes were prepared in a first pass study to evaluate how precursor performance is affected by modulation of the peripheral substituents in the ligands. Thermal analyses, (TGA, DSC) show that the silylated Cu(II) precursors (SiR3=SiMe3; R′=t-Bu or i-Bu) have greater volatility than the corresponding carbon analogues. Some of the new Cu(II) complexes exist as liquids or low melting solids, which are preferred states for industrial deposition processes. X-ray diffraction studies of selected copper complexes showed them to have typical, square planar geometry; calculations of molecular volumes suggest that packing in the solid-state is less efficient for the silicon-containing complexes than for the non-silylated analogues.

Investigations into the preparation of sila-β-diketones via 2-trimethylsilyl-1,3-dithianes: Structural characterization of a second polymorph of bis(2,2,6,6-tetramethyl-2-sila-3,5- heptanedionato)copper(II)

Claessen, Rolf U.,Kornilov, Andrei M.,Banger, Kulbinder K.,Ngo, Silvana C.,Higashiya, Seiichiro,Wells, Christopher C.,Dikarev, Evgeny V.,Toscano, Paul J.,Welch, John T.

, p. 71 - 81 (2004)

The sila-β-diketone, 2,2,6,6-tetramethyl-2-silaheptane-3,5-dione (tmshdH), was synthesized by the condensation of the anion of 2-trimethylsilyl-1,3-dithiane with 1-bromo-3,3-dimethylbutan-2-one, followed by unmasking of the latent carbonyl moiety with HgO/HgCl2. A monoclinic polymorph of the known copper(II) complex, Cu(tmshd)2, was crystallized and studied by X-ray diffraction methods and found to be disordered like the orthorhombic one. Attempts to synthesize the disilylated β-diketone, 2,2,6,6-tetramethyl-2,6-disilaheptane-3,5-dione and monosilylated 4,4-dimethyl-4-sila-3-oxo-pentanal using the dithiane method were not successful. However, the 1,3-dithianyl precursors, along with the impurity 2,2′-bis(trimethylsilyl)-2,2′- bi-1,3-dithiane, were studied crystallographically. Large stereoelectronic and steric effects on the solid-state bonding parameters were observed for these molecules.

MOCVD precursors based on organometalloid ligands

-

Example 3, (2008/06/13)

Volatile metal complexes with α-sila-β-diketonate ligands containing haloalkyl, and particularly, perfluoroalkyl, substitutents are useful as metal precursors for chemical vapor deposition processes and as nanostructured materials containing fluorous domains.

Post a RFQ

Enter 15 to 2000 letters.Word count: 0 letters

Attach files(File Format: Jpeg, Jpg, Gif, Png, PDF, PPT, Zip, Rar,Word or Excel Maximum File Size: 3MB)

1

What can I do for you?
Get Best Price

Get Best Price for 286854-89-5