31480-93-0

Basic information

• Product Name: p-hydroxyphenyl methacrylate
• Synonyms: 2-Methylpropenoic acid 4-hydroxyphenyl ester;Methacrylic acid=4-hydroxyphenyl ester;2-Propenoic acid, 2-methyl-, 4-hydroxyphenyl ester;Einecs 250-652-7;4-hydroxyphenyl Methacrylate;p-hydroxyphenyl methacrylate
• CAS NO: 31480-93-0
• Molecular Formula: C₁₀H₁₀O₃
• Molecular Weight: 178.1846
• EINECS: 250-652-7
• Mol File: 31480-93-0.mol

Chemical Properties

• Melting Point: 120 °C
• Boiling Point: 320.4°Cat760mmHg
• Flash Point: 140.5°C
• Appearance: /
• Density: 1.161g/cm³
• Vapor Pressure: 0.00017mmHg at 25°C
• Refractive Index: 1.542
• PKA: 9.31±0.15(Predicted)
• CAS DataBase Reference: p-hydroxyphenyl methacrylate(CAS DataBase Reference)
• NIST Chemistry Reference: p-hydroxyphenyl methacrylate(31480-93-0)
• EPA Substance Registry System: p-hydroxyphenyl methacrylate(31480-93-0)

Safety Data

• Hazardous Substances Data: 31480-93-0(Hazardous Substances Data)

Usage

Chemical Properties

white to light yellow to light orange powder to crystal

Uses

p-Hydroxyphenyl methacrylate?can be used as a precursor for a carbon nanotube. This material has been studied for its adsorption kinetics, dose-dependent, and directional properties. It?has been shown to have chloride ion sensitive adsorption properties. It also has an isotherm that is dependent on temperature and irradiation with UV light. When irradiated with UV light, it shows gel matrix formation and crosslinking. p-Hydroxyphenyl methacrylate can also be used in membranes and water surface gels.

Preparation

The preparation of?p-hydroxyphenyl methacrylate is as follows:Add 3992ml of n-hexane to the 5L four-necked flask equipped with stirring paddle, condenser tube and thermometer, turn on stirring, add 83.78g of p-hydroxyphenol to the system, slowly add 0.02g of polymerization inhibitor p-benzoquinone to the reaction system, add 102.36 g of g basic ion exchange resin, adjust pH=7-8, cool down to -19°C, slowly add 102.36g vinyl methacrylate dropwise to the reaction system, keep the reaction for 6h, monitor the reaction progress, take samples to detect the reaction is complete and then go to the reaction system 1000 ml of water was added, and the mixture was stirred for extraction and phase separation. The organic phase was dried, concentrated under reduced pressure and evaporated to dryness to obtain 127 g of 2-methyl-2-acrylic acid-4-hydroxyphenyl ester product, with a yield of 93.68%.

InChI:InChI=1/C10H10O3/c1-7(2)10(12)13-9-5-3-8(11)4-6-9/h3-6,11H,1H2,2H3

Upstream product

• 79-41-4 poly(methacrylic acid) 
• 760-93-0 methacryloyl anhydride 
• 123-31-9 hydroquinone 
• 3233-32-7 hydroquinone monoacetate 
• 53936-56-4 4-(tetrahydro-2H-2-pyranyloxy)phenol 
• 103-16-2 4-Benzyloxyphenol 
• 53936-79-1 4-benzyloxyphenyl 2-tetrahydropyranyl ether 
• 920-46-7 Methacryloyl chloride 

Downstream Products

• 1379458-32-8 4-(tosyloxy)phenyl methacrylate 

Relevant articles and documents

POLYMERIZABLE CINNAMATE ESTER DERIVATIVE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a method of manufacturing a polymerizable cinnamate ester derivative that can be added to a liquid crystal composition in producing a TFT liquid crystal display element so as to reduce burning in the display element; a method of manufacturing a polymerizable composition containing the polymerizable cinnamate ester derivative; and a method of manufacturing a liquid crystal display element by polymerizing the polymerizable composition. SOLUTION: A method of manufacturing a compound represented by the specified general formula (III) includes reacting a compound represented by the specified general formula (I) with a compound represented by the specified general formula (II). SELECTED DRAWING: None COPYRIGHT: (C)2020,JPOandINPIT

Polymerizable compound, a liquid crystal display element and polymerizable composition

PROBLEM TO BE SOLVED: To provide a polymerizable compound having proper polymerization reactivity, high conversion rate and high solubility to a liquid crystal composition, a polymerizable composition containing the compound, a liquid crystal composite prepared from the composition and a liquid crystal display element having the composite.SOLUTION: There is provided a polymerizable compound having the following structure: (in the formula, Pand Pare a polymerizable group; rings Ato Aare 1,4-phenylene, Zand Zare a single bond or alkylene; Lto Lare a single bond; and a, b, c and d are 0 or 1.)

Method for producing aromatic diol mono(meth)acrylate

The present invention refers to, colored, insoluble solvent and the minute to do , high purity aromatic diol mono (metadata) acrylate to obtain a is method, economical manufacturing method provides advantageous in. In order to obtain the above-the, the present invention refers to, aromatic diol and (metadata) acrylic acid, an esterification reaction in the presence of strong acid to the aromatic diol mono (metadata) acrylate is method for producing, said method is the presence of an aprotic organic solvent or solventless 100 to 140 °C in carried out, heating using the moisture in the blended mix reaction system while removing the low by reducing the pressure in a including esterification reaction step of reacting a carboxylic acid component, aromatic diol mono (metadata) acrylate provides method for producing.

Novel polymeric nonionic photoacid generators and corresponding polymer Langmuir-Blodgett (LB) films for photopatterning

A series of new polymeric nonionic photoacid generators (PAGs) and PAG-bound polymers designed for photoresist materials in Langmuir-Blodgett (LB) films have been synthesized and characterized. The novel polymer could form a stable and condensed monolayer on water surface, which could be transferred successfully onto solid substrate. Upon deep UV irradiation, the acid generated by the photoacid generator catalyzed the naphthyl moiety to liberate naphthol and regenerate carboxyl in the exposed region. The rent moiety could dissolve in alkaline aqueous, resulting in a fine positive tone resist patterns with a resolution of 0.75 μm. Sensitivity curves and TGA studies revealed that the high sensitivity in 248 nm irradiation was attributed to the present of PAG units incorporated in the polymer chains. The result of translated gold pattern with the same resolution as the resist pattern also demonstrated that the resist LB films had sufficient resistance to wet etching process.

Method for producing hydroxyphenyl acrylate monomers and polymers

New syntheses of phenolic acrylate monomers are provided as well as polymers comprising such phenolic acrylate monomers. Preferred polymers of the invention are useful as a resin component of chemically-amplified positive-acting resists.