484649-06-1

Basic information

• Product Name: Bicyclo[2.2.1]hept-5-ene-2-carbonyl fluoride, 2-fluoro- (9CI)
• Synonyms: Bicyclo[2.2.1]hept-5-ene-2-carbonyl fluoride, 2-fluoro- (9CI)
• CAS NO: 484649-06-1
• Molecular Formula: C8H8F2O
• Molecular Weight: 158.1453264
• Product Categories: ACIDHALIDE;HALIDE
• Mol File: 484649-06-1.mol

Chemical Properties

• Appearance: /
• CAS DataBase Reference: Bicyclo[2.2.1]hept-5-ene-2-carbonyl fluoride, 2-fluoro- (9CI)(CAS DataBase Reference)
• NIST Chemistry Reference: Bicyclo[2.2.1]hept-5-ene-2-carbonyl fluoride, 2-fluoro- (9CI)(484649-06-1)
• EPA Substance Registry System: Bicyclo[2.2.1]hept-5-ene-2-carbonyl fluoride, 2-fluoro- (9CI)(484649-06-1)

Safety Data

• Hazardous Substances Data: 484649-06-1(Hazardous Substances Data)

Upstream product

• 60556-85-6 2-Fluoroprop-2-enoyl fluoride 
• 542-92-7 cyclopenta-1,3-diene 

Downstream Products

• 484649-24-3 C₈H₉FO₂ 

Relevant articles and documents

PROCESS FOR PRODUCTION OF FLUORINE-CONTAINING NORBORNENE DERIVATIVES

There are provided a novel norbornene derivative which is a material for a chemically amplifying type photoresist for F2 laser, possesses excellent transparency and improved dry etching resistivity and has a fluorine-containing ketone unit or fluorine-containing tertiary alcohol unit directly bonded to the norbornene backbone; a fluorine-containing polymer obtained by using the norbornene derivative as a copolymerizable monomer; and a chemically amplifying type photoresist composition comprising the fluorine-containing polymer, a photoacid generator and a solvent.

Dissolution behavior of tetrafluoroethylene-based fluoropolymers for 157-nm resist materials

We have synthesized various main-chain fluorinated polymers and studied base-resin properties, such as transparency at 157 nm, solubility in a standard alkaline developer, and lithographic performance. Main-chain-fluorinated polymers were synthesized by copolymerization of tetrafluoroethylene (TFE) with cyclic monomers, especially newly synthesized norbornene derivatives. We studied the correlation between pKa(OH) and the solubility of the copolymers of TFE and functional (fluoroalkyl alcohol group) norbornenes. Their solubility depends on the pKa value of the fluoroalkyl alcohol groups. We studied the impact of the polymerization initiators on base-resin properties. High transparency was obtained by using the fluorocarbon initiator. It was also confirmed that the monocyclic component improves dry-etch resistance and that fluorination at the terminal groups improves alkaline solubility. In addition, we found that the development characteristics of TFE/norbornene copolymers were significantly improved by the stereoselective (endo versus exo) partial protection of the hydroxyl groups in the fluoroalkyl alcohol moiety attached to norbornene unit. The polymer protected only in the exo position of the norbornene unit in the copolymer had a higher Rmax and a higher contrast. Positive-working resists based on these fluoropolymers were developed and 55 nm dense lines could be delineated by exposure at 157 nm wavelength with an alternating phase shift mask on a 0.9 NA 157 nm exposure tool. We have synthesized various main-chain fluorinated polymers and studied their transparency, dry-etch durability and solubility.