144317-44-2

Basic information

• Product Name: Triphenylsulfonium nonaflate
• Synonyms: TriphenylsulfoniuM perfluoro-1-butanesufonate electronic grade, >=99%;TRIPHENYLSULFONIUM PERFLUORO-1-;TRIPHENYLSULFONIUM PERFLUORO-1-BUTANESUL;Triphenyl sulfonium salt with 1,1,2,2,3,3,4,4,4-nonafluoro-1-butanesulfonic acid(1:1);Triphenylsulfonium nonaflate;Triphenylsulfonium perfluoro-1-butanesufonate
• CAS NO: 144317-44-2
• Molecular Formula: C22H15F9O3S2
• Molecular Weight: 562.47
• Product Categories: Cationic PhotoinitiatorsSelf Assembly&Contact Printing;Organic Photoinitiators;Photoacid Generators (PAGs);Photoresists;Polymerization Initiators
• Mol File: 144317-44-2.mol
• Article Data: 14

Chemical Properties

• Melting Point: 84-88 °C(lit.)
• Appearance: /
• Solubility: PGMEA: ~50%
• CAS DataBase Reference: Triphenylsulfonium nonaflate(CAS DataBase Reference)
• NIST Chemistry Reference: Triphenylsulfonium nonaflate(144317-44-2)
• EPA Substance Registry System: Triphenylsulfonium nonaflate(144317-44-2)

Safety Data

• Hazard Codes: Xi
• Statements: 36/37/38
• Safety Statements: 26-36
• WGK Germany: 3
• Hazardous Substances Data: 144317-44-2(Hazardous Substances Data)

Usage

Uses

Cationic photoinitiator. Photoacid generator.

Upstream product

• 3353-89-7 triphenylsulfonium bromide 
• 60453-92-1 sodium 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate 
• 29420-49-3 potassium nonaflate 

Relevant articles and documents

Driving Force Dependence of Electron Transfer from Electronically Excited [Ir(COD)(μ-Me2pz)]2 to Photo-Acid Generators

We report the rates of electron transfer (ET) reactions of electronically excited [Ir(COD)(μ-Me2pz)]2 with onium salt photoacid generators (PAGs). The reduction potentials of the PAGs span a large electrochemical window that allows determination of the driving force dependence of the ET reactions. Rate constants of ET from electronically excited [Ir(COD)(μ-Me2pz)]2 to onium PAGs are determined by the reaction driving force until the diffusion limit in acetonitrile is reached.

Multi-onium salt type photoacid generator for ArF light source dry photoetching

The invention discloses a multi-onium salt type photoacid generator for ArF light source dry photoetching. The photoacid generator is an onium salt having anions and onium ions, wherein the anions have a structure represented by a formula (I), the onium ions have a structure represented by a formula (A) or a formula (B), and the number of the onium ions enables the charge of the onium salt to maintain neutral. The photoresist containing the onium salt provided by the invention has better resolution, sensitivity and line width roughness.

Radiation-sensitive resin composition and radiation-sensitive acid generating agent

A radiation-sensitive resin composition includes a compound represented by a formula (1), and a base polymer. A represents —CO— or —CH2—. R1 represents a hydrocarbon group having 1 to 30 carbon atoms, a heterocyclic group having 3 to 30 ring atoms, or a combination of a first group and a second group. The first group is —CO—, —COO—, —OCO—, —O—CO—O—, —NHCO—, —CONH—, —NH—CO—O—, —O—CO—NH—, —NH—, —S—, —SO—, —SO2—, —SO2—O— or a combination thereof, and the second group is a hydrocarbon group having 1 to 30 carbon atoms, a heterocyclic group having 3 to 30 ring atoms or a combination thereof. A part or all of hydrogen atoms included in the hydrocarbon group and the heterocyclic group are not substituted or substituted. M+ represents a monovalent cation.