16898-52-5Relevant articles and documents
A novel negative-working photoimaging material based on a base-amplifying silicone resin tethering phenylsulfonylethyl groups
Inoue, Satoru,Arimitsu, Koji,Abe, Yoshimoto,Ichimura, Kunihiro
, p. 1308 - 1309 (2007)
We have developed a base-sensitive silicone resin tethering phenylsulfonylethyl units as base-amplifying groups showing high thermal stability. The resin underwent a base proliferation reaction autocatalytically to generate amino groups on its side chains, which accelerated the base-catalyzed hydrolytic condensation of residual ethoxysilyl units in its main chain. Furthermore, a film of the resin sensitized with a photobase generator provided a negative-working photoimaging material with a high sensitivity. Copyright
Photobase generators derived from trans-o-coumaric acid for anionic UV curing systems without gas generation
Arimitsu, Koji,Takemori, Yuri,Nakajima, Atsushi,Oguri, Ayaka,Furutani, Masahiro,Gunji, Takahiro,Abe, Yoshimoto
, p. 1174 - 1177 (2015/04/14)
Anionic UV curing systems of poly(glycerol methacrylate) and/or poly[3-(methacryloyloxy)propyltrimethoxysilane] are obtained using novel photobase generators (PBGs) derived from trans-o-coumaric acid. These PBGs decompose into amines and coumarins by UV i
Preparation of esters of phosphorus acids
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, (2008/06/13)
Esters of phosphorus acids are prepared by an improved process whereby aromatic alcohols and phosphorus halides are reacted at specified temperatures in the presence of amine catalysts thereby providing high yields of substantially pure esters and allowing preparation of selected halogen-containing mono- and di-esters of phosphorus acids wherein halogen is directly bonded to phosphorus having substantially no side reactant contamination. The phosphorus esters are useful as intermediates in the preparation of plasticizers, oil additives and functional fluids.