38432-77-8

Basic information

• Product Name: 2-Isopropyl-2-adamantanol
• Synonyms: 2-Isoproyl-2-AdaMantanol;2-IsopropyladaMantan-2-ol;2-isoipropyl-2-adaMantanol;2-Isopropyl-2-adamantanol（WS201366）;2-ethtyl-2-adamantanol;2-isopropyl-2-hydroxyadamantane
• CAS NO: 38432-77-8
• Molecular Formula: C₁₃H₂₂O
• Molecular Weight: 194.31
• Mol File: 38432-77-8.mol

Chemical Properties

• Boiling Point: 280℃
• Flash Point: 117℃
• Appearance: /
• Density: 1.039
• Storage Temp.: 2-8°C
• CAS DataBase Reference: 2-Isopropyl-2-adamantanol(CAS DataBase Reference)
• NIST Chemistry Reference: 2-Isopropyl-2-adamantanol(38432-77-8)
• EPA Substance Registry System: 2-Isopropyl-2-adamantanol(38432-77-8)

Safety Data

• Hazardous Substances Data: 38432-77-8(Hazardous Substances Data)

Usage

Uses

Used in Organic Synthesis:
2-Isopropyl-2-adamantanol is utilized as a chiral auxiliary in organic synthesis for its ability to influence the stereochemistry of reactions, leading to the production of enantiomerically pure compounds. Its adamantane-based structure provides a robust and stable platform for asymmetric synthesis, enhancing the efficiency and selectivity of chemical reactions.
Used in Pharmaceutical Production:
In the pharmaceutical industry, 2-Isopropyl-2-adamantanol serves as a valuable precursor for the synthesis of various drugs. Its unique structural features allow for the development of new pharmaceutical compounds with improved therapeutic properties, such as enhanced bioavailability, selectivity, and reduced side effects.
Used in Agrochemicals:
2-Isopropyl-2-adamantanol is also employed in the agrochemical sector as a precursor for the synthesis of novel agrochemicals. Its stable and resistant nature makes it suitable for the development of pesticides and other agrochemicals with increased effectiveness and durability.
Used in Material Science:
The unique adamantane-based structure of 2-Isopropyl-2-adamantanol makes it a promising candidate for the development of new materials with specific properties. It can be used in the creation of advanced materials for various applications, such as high-performance polymers, coatings, and other specialized materials that require stability and resistance to harsh conditions.

InChI:InChI=1S/C13H22O/c1-8(2)13(14)11-4-9-3-10(6-11)7-12(13)5-9/h8-12,14H,3-7H2,1-2H3

Upstream product

• 700-58-3 2-Adamantanone 
• 920-39-8 isopropylmagnesium bromide 
• 1888-75-1 isopropyllithium 

Downstream Products

• 251564-67-7 2-isopropyl-2-adamantyl acrylate 
• 297156-50-4 2-isopropyl-2-adamantyl methacrylate 

Relevant articles and documents

Zinc(II)-catalyzed addition of grignard reagents to ketones

(Figure presented) The addition of organometallic reagents to carbonyl compounds has become a versatile method for synthesizing tertiary and secondary alcohols via carbon-carbon bond formation. However, due to the lack of good nucleophilicity or the presence of strong basicity of organometallic reagents, the efficient synthesis of tertiary alcohols from ketones has been particularly difficult and, thus, limited. We recently developed highly efficient catalytic alkylation and arylation reactions to ketones with Grignard reagents (RMgX: R = alkyl, aryl; X = Cl, Br, I) using ZnCl2, Me3SiCH 2MgCl, and LiCl, which effectively minimize problematic side reactions. In principle, RMgBr and RMgI are less reactive than RMgCl for the addition to carbonyl compounds. Therefore, this novel method with homogeneous catalytic ZnCl2·Me3SiCH2MgCl·LiCl is quite attractive, since RMgBr and RMgI, which are easily prepared and/or commercially available, like RMgCl, can be applied successfully. As well as ketones and aldehydes, aldimines were effectively applied to this catalysis, and the corresponding secondary amines were obtained in high yield. With regard to mechanistic details concerning β-silyl effect and salt effect, in situ-prepared [R(Me3SiCH2)2Zn] -[Li]+[MgX2]m[LiCl]n (X = Cl/Br/I) is speculated to be a key catalytic reagent to promote the reaction effectively. The simplicity of this reliable ZnCl2·Me 3SiCH2MgCl·LiCl system in the addition of Grignard reagents to carbonyl compounds might be attractive for industrial as well as academic applications.

ACID-SENSITIVE COMPOUND AND RESIN COMPOSITION FOR PHOTORESIST

The photoresist resin composition comprises a polymer containing an acid-responsive compound unit of the following formula (e.g. an adamantane skeleton) and a photoactive acid precursor. R1 may be an alkyl group having a tertiary carbon atom in the 1-position and the Z ring is a bridged-ring hydrocarbon ring comprising 2 to 4 rings. ???wherein R1 and R2 are the same or different from each other and each represents a hydrogen atom, an alkyl group or a cycloalkyl group; R3 represents a hydrogen atom or a methyl group; R4 represents a hydrogen atom, a halogen atom, an alkyl group, an oxygen-containing group, an amino group or an N-substituted amino group; the Z ring represents a monocyclic or polycyclic alicyclic hydrocarbon ring; n represents an integer of not less than 1; with proviso that R4 does not concurrently represent a hydrogen atom, and may be different over n occurrences; in formula (1), R1 and R2 may, jointly and together with the adjacent carbon atom, form an alicyclic hydrocarbon ring. The above photoresist resin composition is high in etching resistance, can be solubilized by irradiation, and is capable of providing a finer line pattern.