251564-67-7Relevant academic research and scientific papers
Method for synthesizing adamantyl (meth) acrylate
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Paragraph 0043-0044; 0046-0047, (2021/05/19)
The invention discloses a method for synthesizing adamantyl (meth) acrylate, and relates to the field of organic synthesis. The method for synthesizing adamantyl (meth) acrylate comprises the steps: 1, reacting (methyl) acrylic acid with alkyl sulfonyl chloride to generate mixed anhydride S1; 2, reacting 2-adamantanone with halogenated alkane under the action of a lithium reagent or a Grignard reagent to generate an intermediate S2; and 3, reacting the mixed anhydride S1 with the intermediate S2 to generate the adamantyl (meth) acrylate. The invention provides a synthetic method of adamantyl (meth) acrylate, and provides more selectivity for synthesis of adamantyl (meth) acrylate. The synthesis method disclosed by the invention is high in yield, high in product purity and low in synthesis cost.
Preparation method and device of 2-isopropyl-2-adamantanol (methyl) acrylate
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Paragraph 0035, (2019/06/07)
The invention discloses a preparation method of 2-isopropyl-2-adamantanol (methyl) acrylate, and the method is characterized in that the 2-isopropyl-2-adamantanol (methyl) acrylate is prepared from (methyl) acrylate and isopropyl adamantane alcohol as reaction raw materials by taking an alkaline compound as a catalyst and carrying out ester exchange reaction at 40-120 DEG C in the presence of a solvent, wherein the alkaline compound catalyst is loaded on a porous carrier; the reaction liquid is filtered by a plate-type filter at 60-80 DEG C and then is cooled to a temperature of -60 DEG C to 0DEG C, and a separated solid is the 2-isopropyl-2-adamantanol (methyl) acrylate. According to the invention, the alkaline compound is used for loading a porous catalyst, the production process stepsare simple, the reaction is thorough, the yield is up to more than 95%, the purification process is simple, the purity of the product reaches more than 98%, the solvent and the catalyst can be recycled, the production cost is saved, and the preparation method realizes zero emission of pollutants, and is a green production method.
ACID-SENSITIVE COMPOUND AND RESIN COMPOSITION FOR PHOTORESIST
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, (2008/06/13)
The photoresist resin composition comprises a polymer containing an acid-responsive compound unit of the following formula (e.g. an adamantane skeleton) and a photoactive acid precursor. R1 may be an alkyl group having a tertiary carbon atom in the 1-position and the Z ring is a bridged-ring hydrocarbon ring comprising 2 to 4 rings. ???wherein R1 and R2 are the same or different from each other and each represents a hydrogen atom, an alkyl group or a cycloalkyl group; R3 represents a hydrogen atom or a methyl group; R4 represents a hydrogen atom, a halogen atom, an alkyl group, an oxygen-containing group, an amino group or an N-substituted amino group; the Z ring represents a monocyclic or polycyclic alicyclic hydrocarbon ring; n represents an integer of not less than 1; with proviso that R4 does not concurrently represent a hydrogen atom, and may be different over n occurrences; in formula (1), R1 and R2 may, jointly and together with the adjacent carbon atom, form an alicyclic hydrocarbon ring. The above photoresist resin composition is high in etching resistance, can be solubilized by irradiation, and is capable of providing a finer line pattern.
