Gas-Phase Reactions of Anions with Substituted Silanes

Article abstract of DOI:10.1021/ja00535a031

The gas-phase reactions of fluoride, amide, hydroxide, and methoxide ions with a variety of substituted silanes have been studied by the flowing afterglow technique.Fluoride reacts readily with trimethylsilyl derivatives to displace benzyl, alkenyl, and alkynyl anions.These reactions have also been used to generate specific structural isomers (CH3CC^- and CH2C=C=CH^-).Anions more basic than phenide ion cannot be produced in this manner, and their parent trimethylsilanes interact with fluoride by more complex mechanisms.Amide, hydroxide, and methoxide ions react with substituted trimethylsilanes by both displacement and proton abstraction whenever an acidic hydrogen is present; in the absence of displaceable groups and acidic hydrogen, the reactions of amide, hydroxide, and methoxide parallel those of fluoride ion.