tions.3 Compounds 3 have mainly been used for the formation
of R-fluoro acids,3b R-hydroxy acids,3c,d R-amino acids,3c,d
epoxides,3e vinyl dichlorides,3f and terminal alkynes.3g Our group
reported transformation of 2,2,2-trichloromethylcarbinols 3 into
2-haloalk-2(Z)-en-1-ols and 1-chloro-1(Z)-alkenes,3h and more
recently a ring expansion/homologation-aldehyde condensation
cascade sequence with cyclic trichloromethylcarbinols.3i
Although trifluoromethyl group transfer to carbonyl com-
pounds has been thoroughly studied with trifluoromethyltrim-
ethylsilane (TMSCF3, Ruppert’s reagent),4 only a few methods
for the preparation of 2 by mean of a trichloromethyl-providing
reagent are reported in the literature.5 Trichloromethyltrimeth-
ylsilane (TMSCCl3),5b,c,d,g trimethylsilyl trichloroacetate (Cl3-
CCO2TMS),5e,f or a combination of trimethylsilyl chloride
(TMSCl) and carbon tetrachloride (CCl4) have been used
successfully.5a Base catalysis with various F- sources [tris-
(diethylamino)sulfonium difluoromethylsilicate (TASF),5b,c,f
potassium fluoride (KF),5f and tetrabutylammonium fluoride
(TBAF)5g] or potassium carbonate (K2CO3)5e are the most
efficient and widely used reaction conditions described.
In the course of our studies, a general method for the
preparation of 2 under mild conditions compatible with both
acid- and base-sensitive substrates was needed. In this respect
the reported methods showed some restrictions. Indeed, the
diversity and sensitivity of the substrates, aldehydes and ketones,
studied in the previous reports are limited. This observation
prompted us to investigate new reaction conditions for the
formation of 2 using the readily accessible TMSCCl3.6
Trichloromethyltrimethylsilane, Sodium Formate,
and Dimethylformamide: A Mild, Efficient, and
General Method for the Preparation of
Trimethylsilyl-Protected
2,2,2-Trichloromethylcarbinols from Aldehydes
and Ketones
Je´re´my Kister and Charles Mioskowski*
Laboratoire de Synthe`se Bio-Organique, UMR 7175--LC1,
Faculte´ de Pharmacie, UniVersite´ Louis Pasteur, 74 Route du
Rhin, BP 24, 67401 Illkirch Graffenstaden, France
ReceiVed February 1, 2007
First, acetophenone was used as a model substrate for the
screening of various bases as catalyst for the formation of 2
(Table 1). Fluorine-, phosphorus-, and oxygen-based as well as
nitrogen-based Lewis bases were explored. All reactions led to
the clean formation of 2, although with variable yields. After
workup the crude mixture was composed of product 2 and the
starting acetophenone. It turned out that both TBAF and KF
led to low conversion in dimethylformamide (DMF) (Table 1,
entries 2 and 3). Phosphorus-based catalysts were inefficient
(Table 1, entries 4-6). Among the different nitrogen-donor
Lewis bases used, TBD was the most efficient (Table 1, entry
New conditions for the preparation of trimethylsilyl-protected
2,2,2-trichloromethylcarbinols 2 from aldehydes and ketones
are reported. Compounds 2, which are important intermedi-
ates in organic synthesis, were obtained in excellent yields
by use of a combination of trichloromethyltrimethylsilane
(TMSCCl3), and a catalytic amount of sodium formate
(HCOONa) in dimethylformamide (DMF). Substrates bear-
ing highly sensitive protecting groups have been successfully
subjected to our conditions. We also describe a one-pot
procedure that gives direct access to 2,2,2-trichloromethyl-
carbinols 3. This methodology avoids the use of strong bases
usually required for the synthesis of 3 (Wyvratt et al. J. Org.
Chem. 1987, 52, 944; Aggarwal and Mereu, J. Org. Chem.
2000, 65, 7211).
(3) (a) For a review, see Reeve, W. Synthesis 1971, 131-138. (b)
Khrimian, A. P.; Oliver, J. E.; Waters, R. M.; Panicker, S.; Nicholson, J.
M.; Klun, J. A. Tetrahedron: Asymmetry 1996, 7 (1), 37-40. (c) Corey,
E. J.; Link, J. O. Tetrahedron Lett. 1992, 33 (24), 3431-3434. (d) Corey,
E. J.; Link, J. O. J. Am. Chem. Soc. 1992, 114 (5), 1906-1908. (e) Corey
E. J.; Helal, C. J. Tetrahedron Lett. 1993, 34 (33), 5227-5230. (f) Li, J.;
Xu, X.; Zhang, Y. Tetrahedron Lett. 2003, 44, 9349-9351. (g) Wang, Z.;
Campagna, S.; Yang, K.; Xu, G.; Pierce, M. E.; Fortunak, J. M.; Confalone,
P. N. J. Org. Chem. 2000, 65, 1889-1891. (h) Baati, R.; Barma, D. K.;
Falck, J. R.; Mioskowski, C. Tetrahedron Lett. 2002, 43, 2183-2185. (i)
Falck, J. R.; He, A.; Reddy, L. M.; Kundu, A.; Barma, D. K.; Bandyo-
padhyay, A.; Kamilia, S.; Akella, R.; Bejot, R.; Mioskowski, C. Org. Lett.
2006, 8 (20), 4645-4647.
Trimethylsilyl-protected 2,2,2-trichloromethylcarbinols 2 are
valuable intermediates in organic synthesis and are involved in
a variety of transformations.1 Indeed, they are known precursors
of (Z)-2-chloroalk-2-en-1-ols,1a R-chloroketones, vinyl dichlo-
rides, and terminal alkynes.1b Moreover, trimethylsilyl (TMS)
deprotection of 22 gives access to 2,2,2-trichloromethylcarbinols
3, which have been subjected to numerous chemical transforma-
(4) For reviews, see (a) Prakash, G. K. S.; Yudin, A. K. Chem. ReV.
1997, 97, 757-786. (b) Singh, R. P.; Shreeve, J. M. Tetrahedron 2000,
56, 7613-7632.
(5) (a) Brunner, H.; Wimmer, P. J. Organomet. Chem. 1986, 309, C4-
C6. (b) Fujita, M.; Hiyama, T. J. Am. Chem. Soc. 1985, 107, 4085-4087.
(c) Fujita, M.; Obayashi, M.; Hiyama, T. Tetrahedron 1988, 44 (13), 4135-
4145. (d) Gisch, J. F.; Landgrebe, J. A. J. Org. Chem. 1985, 50, 2050-
2054. (e) Renga, J. Tetrahedron Lett. 1985, 26 (9), 1175-1178. (f) de Jesus,
M. A.; Prieto, J. A.; del Valle, L.; Larson, G. L. Synth. Commun. 1987, 17
(9), 1047-1051. (g) Wang, P. C. (The Dow Chemical Company). U.S.
Patent 4634787, 1987.
(1) (a) Takai, K.; Kokumai, R.; Nobunaka, T. Chem. Commun. 2001,
1128-1129. (b) Villieras, J.; Bacquet, C.; Normant, J. F. J. Organomet.
Chem. 1975, 97, 355-374.
(2) (a) Fujita, M.; Hiyama, T. J. Am. Chem. Soc. 1985, 107, 4085-
4087. (b) Renga, J. M.; Pen-Chung, W. Tetrahedron Lett. 1985, 26 (9),
1175-1178. (c) Deleris, G.; Dunogues, J.; Barbin, P.; Calas, R.; Bardone,
M.-C.; Guyonnet, J.-C. Eur. J. Med. Chem.: Chim. Ther. 1981, 16 (6),
533-537.
(6) Hergott, H. H.; Simchen, G. Synthesis 1980, 626-627.
10.1021/jo070180w CCC: $37.00 © 2007 American Chemical Society
Published on Web 04/20/2007
J. Org. Chem. 2007, 72, 3925-3928
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