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DOI: 10.1063/1.104655

Source and publish data:

Applied Physics Letters p. 419 - 421 (1991)

Update date:2022-08-11

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Authors:

Luo, LiLuo, Li

Muenchausen, R. E.Muenchausen, R. E.

Maggiore, C. J.Maggiore, C. J.

Jimmenez, J. R.Jimmenez, J. R.

Schowalter, L. J.Schowalter, L. J.

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Article abstract of DOI:10.1063/1.104655

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Full text of DOI:10.1063/1.104655

Growth of YBa2Cu3O7−x thin films on Si with a CoSi2 buffer layer  
Li Luo, R. E. Muenchausen, C. J. Maggiore, J. R. Jimenez, and L. J. Schowalter  
Citation: Applied Physics Letters 58, 419 (1991); doi: 10.1063/1.104655  
View online: http://dx.doi.org/10.1063/1.104655  
View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/58/4?ver=pdfcov  
Published by the AIP Publishing  
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:  
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:  
128.248.155.225 On: Sun, 23 Nov 2014 07:15:17  
This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:  
128.248.155.225 On: Sun, 23 Nov 2014 07:15:17  
This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:  
128.248.155.225 On: Sun, 23 Nov 2014 07:15:17  

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