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Unii-079V3J9O3X

Base Information
  • Chemical Name:Unii-079V3J9O3X
  • CAS No.:14475-38-8
  • Molecular Formula:H2OSi
  • Molecular Weight:46.1008
  • Hs Code.:
  • UNII:079V3J9O3X
  • DSSTox Substance ID:DTXSID40162797
  • Wikipedia:Silanol
  • Mol file:14475-38-8.mol
Unii-079V3J9O3X

Synonyms:silanol

Suppliers and Price of Unii-079V3J9O3X
Supply Marketing:
Business phase:
The product has achieved commercial mass production*data from LookChem market partment
Manufacturers and distributors:
  • Manufacture/Brand
  • Chemicals and raw materials
  • Packaging
  • price
Total 3 raw suppliers
Chemical Property of Unii-079V3J9O3X
Chemical Property:
  • Boiling Point:°Cat760mmHg 
  • PKA:12.63±0.53(Predicted) 
  • Flash Point:°C 
  • PSA:20.23000 
  • Density:g/cm3 
  • LogP:-0.93780 
  • Hydrogen Bond Donor Count:1
  • Hydrogen Bond Acceptor Count:1
  • Rotatable Bond Count:0
  • Exact Mass:44.979666186
  • Heavy Atom Count:2
  • Complexity:2
Purity/Quality:

99% *data from raw suppliers

Safty Information:
  • Pictogram(s):  
  • Hazard Codes: 
MSDS Files:

SDS file from LookChem

Useful:
  • Canonical SMILES:O[Si]
Technology Process of Unii-079V3J9O3X

There total 9 articles about Unii-079V3J9O3X which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:
Guidance literature:
In gas; Ionization is by electron impact at 50 eV, gas-phase react. of ion carried out in trapped-ion cell (pressure 1E(-8) to 1E(-6) Torr).; Ejecting of unwanted ions with rf excitation of trapping well, react.'s investigation by Fourier transform ion cyclotron resonance spectrometry (FT-ICR).; Kinetics;
DOI:10.1021/ja00183a014
Guidance literature:
In neat (no solvent, gas phase); Irradiation (UV/VIS); 296-339 K, 10-200 Torr; Kinetics;
DOI:10.1021/jp036431w
Guidance literature:
With SO2; In gaseous matrix; in He at 300K, further products; MS, not isolated; Kinetics;
upstream raw materials:

OsO2(1+)

monosilane

water

silicon

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