Technology Process of Acetic acid (2S,3S,4R,5R,6S,7S,8S)-8-acetoxy-3,5-bis-(tert-butyl-dimethyl-silanyloxy)-4-hydroxy-7-(4-methoxy-benzyloxy)-2,4,6-trimethyl-nonyl ester
There total 12 articles about Acetic acid (2S,3S,4R,5R,6S,7S,8S)-8-acetoxy-3,5-bis-(tert-butyl-dimethyl-silanyloxy)-4-hydroxy-7-(4-methoxy-benzyloxy)-2,4,6-trimethyl-nonyl ester which
guide to synthetic route it.
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synthetic route:
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905732-40-3
(2S,3S,4R,5R,6S,7S,8S)-3,5-Bis-(tert-butyl-dimethyl-silanyloxy)-7-(4-methoxy-benzyloxy)-2,4,6-trimethyl-nonane-1,4,8-triol
- Guidance literature:
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With
dmap; triethylamine;
In
dichloromethane;
at 0 ℃;
for 0.5h;
DOI:10.1016/j.tetlet.2006.05.010
- Guidance literature:
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Multi-step reaction with 10 steps
1.1: 85 percent / i-Pr2NEt / TiCl4 / CH2Cl2 / 3 h / -78 °C
2.1: 2,6-lutidine / CH2Cl2 / 1 h / 0 - 20 °C
3.1: CSA / CH2Cl2; methanol / 8 h / 0 °C
4.1: 2,6-lutidine / CH2Cl2 / 0.08 h / 0 °C
5.1: DIBAL-H / CH2Cl2 / 0.25 h / -78 °C
6.1: CSA / CH2Cl2; methanol / 0.25 h / 0 °C
6.2: CSA / CH2Cl2 / 1 h / 0 - 20 °C
6.3: 80 percent / TBAF / tetrahydrofuran / 6 h / 0 - 20 °C
7.1: 84 percent / OsO4 / acetone; H2O / 12 h / 0 - 20 °C
8.1: 2,6-lutidine / CH2Cl2 / 2 h / 0 - 20 °C
8.2: 74 percent / H2 / Pd/C / ethyl acetate / 5 h
9.1: 54 percent / NaCNBH3; TMSCl; 4 Angstroem molecular sieves / acetonitrile / 0.17 h / 0 °C
10.1: 100 percent / Et3N; DMAP / CH2Cl2 / 0.5 h / 0 °C
With
2,6-dimethylpyridine; dmap; osmium(VIII) oxide; chloro-trimethyl-silane; 4 A molecular sieve; camphor-10-sulfonic acid; diisobutylaluminium hydride; sodium cyanoborohydride; triethylamine; N-ethyl-N,N-diisopropylamine;
titanium tetrachloride;
In
methanol; dichloromethane; water; acetone; acetonitrile;
DOI:10.1016/j.tetlet.2006.05.010
- Guidance literature:
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Multi-step reaction with 12 steps
1.1: LAH / diethyl ether / 0.17 h / 0 °C
2.1: SO3-Py; Et3N / dimethylsulfoxide; CH2Cl2 / 0.5 h / 0 °C
3.1: 85 percent / i-Pr2NEt / TiCl4 / CH2Cl2 / 3 h / -78 °C
4.1: 2,6-lutidine / CH2Cl2 / 1 h / 0 - 20 °C
5.1: CSA / CH2Cl2; methanol / 8 h / 0 °C
6.1: 2,6-lutidine / CH2Cl2 / 0.08 h / 0 °C
7.1: DIBAL-H / CH2Cl2 / 0.25 h / -78 °C
8.1: CSA / CH2Cl2; methanol / 0.25 h / 0 °C
8.2: CSA / CH2Cl2 / 1 h / 0 - 20 °C
8.3: 80 percent / TBAF / tetrahydrofuran / 6 h / 0 - 20 °C
9.1: 84 percent / OsO4 / acetone; H2O / 12 h / 0 - 20 °C
10.1: 2,6-lutidine / CH2Cl2 / 2 h / 0 - 20 °C
10.2: 74 percent / H2 / Pd/C / ethyl acetate / 5 h
11.1: 54 percent / NaCNBH3; TMSCl; 4 Angstroem molecular sieves / acetonitrile / 0.17 h / 0 °C
12.1: 100 percent / Et3N; DMAP / CH2Cl2 / 0.5 h / 0 °C
With
2,6-dimethylpyridine; dmap; osmium(VIII) oxide; lithium aluminium tetrahydride; chloro-trimethyl-silane; pyridine-SO3 complex; 4 A molecular sieve; camphor-10-sulfonic acid; diisobutylaluminium hydride; sodium cyanoborohydride; triethylamine; N-ethyl-N,N-diisopropylamine;
titanium tetrachloride;
In
methanol; diethyl ether; dichloromethane; water; dimethyl sulfoxide; acetone; acetonitrile;
DOI:10.1016/j.tetlet.2006.05.010