Technology Process of (1R,6S,7S)-3,7-Dimethyl-7-(4-methyl-3-pentenyl)bicyclo[4.1.0]hept-3-ene
There total 19 articles about (1R,6S,7S)-3,7-Dimethyl-7-(4-methyl-3-pentenyl)bicyclo[4.1.0]hept-3-ene which
guide to synthetic route it.
The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:
synthetic route:
- Guidance literature:
-
With
2,6-dimethylpyridine; tetrabutyl-ammonium chloride;
Yield given. Yields of byproduct given. Title compound not separated from byproducts;
DOI:10.1016/S0040-4039(00)97558-0
- Guidance literature:
-
Multi-step reaction with 9 steps
1: 50 percent / CH2Cl2 / 15 °C / Irradiation
2: 74 percent / HC(OMe)3, TsOH
3: 1) MeLi / 1) -78 deg C 2) -30 to 20 deg C
4: 66 percent / mCPBA / CHCl3 / 20 °C
5: 85 percent / H2 / Raney Ni / tetrahydrofuran / 0 °C
6: 100 percent / H2SO4, SiO2
7: diethyl ether / -78 to 20 deg C
8: (PhO)3PCH3I
9: Bu4NCl, 2,6-lutidine
With
2,6-dimethylpyridine; sulfuric acid; tetrabutyl-ammonium chloride; methyltriphenoxyphosphonium iodide; methyllithium; hydrogen; silica gel; toluene-4-sulfonic acid; 3-chloro-benzenecarboperoxoic acid; trimethyl orthoformate;
nickel;
In
tetrahydrofuran; diethyl ether; dichloromethane; chloroform;
DOI:10.1016/S0040-4039(00)97558-0
- Guidance literature:
-
Multi-step reaction with 9 steps
1: 50 percent / CH2Cl2 / 15 °C / Irradiation
2: 74 percent / HC(OMe)3, TsOH
3: 1) MeLi / 1) -78 deg C 2) -30 to 20 deg C
4: 66 percent / mCPBA / CHCl3 / 20 °C
5: 85 percent / H2 / Raney Ni / tetrahydrofuran / 0 °C
6: 100 percent / H2SO4, SiO2
7: diethyl ether / -78 to 20 deg C
8: (PhO)3PCH3I
9: Bu4NCl, 2,6-lutidine
With
2,6-dimethylpyridine; sulfuric acid; tetrabutyl-ammonium chloride; methyltriphenoxyphosphonium iodide; methyllithium; hydrogen; silica gel; toluene-4-sulfonic acid; 3-chloro-benzenecarboperoxoic acid; trimethyl orthoformate;
nickel;
In
tetrahydrofuran; diethyl ether; dichloromethane; chloroform;
DOI:10.1016/S0040-4039(00)97558-0