C₄₃H₅₀O₁₄

Base Information

Chemical Name:C₄₃H₅₀O₁₄
CAS No.:1204206-79-0
Molecular Formula:C₄₃H₅₀O₁₄
Molecular Weight:790.862
Hs Code.:

C<sub>43</sub>H<sub>50</sub>O<sub>14</sub>

Synonyms:C₄₃H₅₀O₁₄

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Business phase:: The product has achieved commercial mass production^*data from LookChem market partment

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Chemical Property of C₄₃H₅₀O₁₄

Chemical Property:

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Technology Process of C₄₃H₅₀O₁₄

There total 1 articles about C₄₃H₅₀O₁₄ which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:

Reference yield:

: C₃₅H₃₄O₁₄

: 71432-55-8
2-tert-butyl-1,3-diisopropylisourea

: 1204206-79-0
C₄₃H₅₀O₁₄

Guidance literature:: In dichloromethane; at 20 ℃; for 48h; Inert atmosphere;
DOI:10.1002/adsc.200900295

Reference yield: 98.0%

: 1204206-79-0
C₄₃H₅₀O₁₄

: 1286209-82-2
C₃₆H₄₄O₁₄

Guidance literature:: With palladium 10% on activated carbon; hydrogen; acetic acid; In ethyl acetate; at 20 ℃; for 24h; under 750.075 Torr;
DOI:10.1002/chem.201003399

Reference yield:

: 1204206-79-0
C₄₃H₅₀O₁₄

: 1286209-84-4
C₅₁H₆₂O₁₅SSi

Guidance literature:: Multi-step reaction with 4 steps

1.1: palladium 10% on activated carbon; hydrogen; acetic acid / ethyl acetate / 24 h / 20 °C / 750.08 Torr

2.1: oxalyl dichloride; dimethyl sulfoxide; triethylamine / dichloromethane / 1.5 h / -78 - -10 °C

3.1: n-butyllithium / tetrahydrofuran; hexane / 2.5 h / -13 - 0 °C

3.2: -78 °C

3.3: -78 - -10 °C

4.1: dmap / dichloromethane / 16.5 h / 0 - 20 °C

With dmap; n-butyllithium; oxalyl dichloride; palladium 10% on activated carbon; hydrogen; acetic acid; dimethyl sulfoxide; triethylamine; In tetrahydrofuran; hexane; dichloromethane; ethyl acetate; 2.1: Swern oxidation;
DOI:10.1002/chem.201003399