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NICKEL SILICIDE

Base Information Edit
  • Chemical Name:NICKEL SILICIDE
  • CAS No.:12201-89-7
  • Molecular Formula:NiSi2
  • Molecular Weight:114.861
  • Hs Code.:
  • Mol file:12201-89-7.mol
NICKEL SILICIDE

Synonyms:Nickeldisilicide; Nickel silicide

Suppliers and Price of NICKEL SILICIDE
Supply Marketing:Edit
Business phase:
The product has achieved commercial mass production*data from LookChem market partment
Manufacturers and distributors:
  • Manufacture/Brand
  • Chemicals and raw materials
  • Packaging
  • price
Total 5 raw suppliers
Chemical Property of NICKEL SILICIDE Edit
Chemical Property:
  • Melting Point:993°C 
  • PSA:0.00000 
  • Density:4.830 
  • LogP:-0.76160 
Purity/Quality:

99% *data from raw suppliers

Safty Information:
  • Pictogram(s):  
  • Hazard Codes: 
MSDS Files:

SDS file from LookChem

Useful:
Technology Process of NICKEL SILICIDE

There total 12 articles about NICKEL SILICIDE which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:
Guidance literature:
In neat (no solvent); film of Ni deposited (sputtering, scratching of rod) on rear side of Si wafer, heated to 1150°C for 10s in N2 or O2; ppt. of NiSi2 forms on front surface of wafer (transmission electron microscopy);
DOI:10.1063/1.102342
Guidance literature:
In neat (no solvent); Ni evapd. on B-doped Si(100), annealed at 800 °C for 3 min under N2;
DOI:10.1063/1.2190458
Guidance literature:
In neat (no solvent); growth performed in ultrahigh vac. chamber, after flashing substrate for30 s at 1250°C; Ni deposited onto n-type Si(111) at rate of 1 mo nolayer every 2 min, and Joule heating was used to maintain substrate at500°C during this process;
DOI:10.1063/1.1769583
upstream raw materials:

nickel

silicon

platinum

barium

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