C₅₈H₁₁₀O₉Si₃

Base Information

Chemical Name:C₅₈H₁₁₀O₉Si₃
CAS No.:143618-99-9
Molecular Formula:C₅₈H₁₁₀O₉Si₃
Molecular Weight:1035.76
Hs Code.:

C<sub>58</sub>H<sub>110</sub>O<sub>9</sub>Si<sub>3</sub>

Synonyms:C₅₈H₁₁₀O₉Si₃

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Chemical Property of C₅₈H₁₁₀O₉Si₃

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Technology Process of C₅₈H₁₁₀O₉Si₃

There total 28 articles about C₅₈H₁₁₀O₉Si₃ which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:

Reference yield:

: 143680-12-0
(E)-5-Benzyloxy-2,4-dimethyl-2-penten-1-ol

: 143618-99-9
C₅₈H₁₁₀O₉Si₃

Guidance literature:: Multi-step reaction with 13 steps

1: Et₃N, DMAP / CH₂Cl₂ / 10 h / Ambient temperature

2: Na, NH₃ / 0.25 h / -78 °C

3: 90 percent / H₂ / 4 percent rhodium catalyst / CH₂Cl₂ / 5 h / 62057.8 Torr / Ambient temperature

4: Swern oxidation

5: Bu₂BOTf, i-Pr₂EtN / toluene / -78 to 0 deg C

6: 1) Me₃Al / 2) 0 deg C to r.t., 20 h

7: 61 percent / TfOH

8: 1) t-BuLi / 1) THF, -100 deg C, 2) -78 deg C, 1 h

9: Zn(BH₄)2 / diethyl ether / 1 h / -20 °C

10: 2,6-lutidine / CH₂Cl₂ / 0 deg C to r.t.

11: 90 percent / m-CPBA, pyridine / 2 h / -40 deg C to r.t.

13: 1) n-BuLi, 2) bis(trimethylsilyl) peroxide / 1) -78 deg C, 15 min, 2) -78 deg C, 6 h

With pyridine; 2,6-dimethylpyridine; dmap; n-butyllithium; zinc(II) tetrahydroborate; bis-trimethylsilanyl peroxide; trifluorormethanesulfonic acid; di-n-butylboryl trifluoromethanesulfonate; ammonia; hydrogen; trimethylaluminum; tert.-butyl lithium; sodium; triethylamine; N-ethyl-N,N-diisopropylamine; 3-chloro-benzenecarboperoxoic acid; rhodium; In diethyl ether; dichloromethane; toluene;
DOI:10.1021/jo00045a008

Reference yield:

: 143680-11-9
(E)-5-Benzyloxy-2,3-dimethyl-2-pentensaeureethylester

: 143618-99-9
C₅₈H₁₁₀O₉Si₃

Guidance literature:: Multi-step reaction with 14 steps

1: 100 percent / DIBALH / CH₂Cl₂ / -78 - 0 °C

2: Et₃N, DMAP / CH₂Cl₂ / 10 h / Ambient temperature

3: Na, NH₃ / 0.25 h / -78 °C

4: 90 percent / H₂ / 4 percent rhodium catalyst / CH₂Cl₂ / 5 h / 62057.8 Torr / Ambient temperature

5: Swern oxidation

6: Bu₂BOTf, i-Pr₂EtN / toluene / -78 to 0 deg C

7: 1) Me₃Al / 2) 0 deg C to r.t., 20 h

8: 61 percent / TfOH

9: 1) t-BuLi / 1) THF, -100 deg C, 2) -78 deg C, 1 h

10: Zn(BH₄)2 / diethyl ether / 1 h / -20 °C

11: 2,6-lutidine / CH₂Cl₂ / 0 deg C to r.t.

12: 90 percent / m-CPBA, pyridine / 2 h / -40 deg C to r.t.

14: 1) n-BuLi, 2) bis(trimethylsilyl) peroxide / 1) -78 deg C, 15 min, 2) -78 deg C, 6 h

With pyridine; 2,6-dimethylpyridine; dmap; n-butyllithium; zinc(II) tetrahydroborate; bis-trimethylsilanyl peroxide; trifluorormethanesulfonic acid; di-n-butylboryl trifluoromethanesulfonate; ammonia; hydrogen; trimethylaluminum; tert.-butyl lithium; sodium; diisobutylaluminium hydride; triethylamine; N-ethyl-N,N-diisopropylamine; 3-chloro-benzenecarboperoxoic acid; rhodium; In diethyl ether; dichloromethane; toluene;
DOI:10.1021/jo00045a008

Reference yield:

: 143680-13-1
(E)-(R)-5-(tert-Butyl-dimethyl-silanyloxy)-2,4-dimethyl-pent-3-en-1-ol

: 143618-99-9
C₅₈H₁₁₀O₉Si₃

Guidance literature:: Multi-step reaction with 11 steps

1: 90 percent / H₂ / 4 percent rhodium catalyst / CH₂Cl₂ / 5 h / 62057.8 Torr / Ambient temperature

2: Swern oxidation

3: Bu₂BOTf, i-Pr₂EtN / toluene / -78 to 0 deg C

4: 1) Me₃Al / 2) 0 deg C to r.t., 20 h

5: 61 percent / TfOH

6: 1) t-BuLi / 1) THF, -100 deg C, 2) -78 deg C, 1 h

7: Zn(BH₄)2 / diethyl ether / 1 h / -20 °C

8: 2,6-lutidine / CH₂Cl₂ / 0 deg C to r.t.

9: 90 percent / m-CPBA, pyridine / 2 h / -40 deg C to r.t.

11: 1) n-BuLi, 2) bis(trimethylsilyl) peroxide / 1) -78 deg C, 15 min, 2) -78 deg C, 6 h

With pyridine; 2,6-dimethylpyridine; n-butyllithium; zinc(II) tetrahydroborate; bis-trimethylsilanyl peroxide; trifluorormethanesulfonic acid; di-n-butylboryl trifluoromethanesulfonate; hydrogen; trimethylaluminum; tert.-butyl lithium; N-ethyl-N,N-diisopropylamine; 3-chloro-benzenecarboperoxoic acid; rhodium; In diethyl ether; dichloromethane; toluene;
DOI:10.1021/jo00045a008