Shi Epoxidation Oxazolidinone Methyl Catalyst

Base Information

Chemical Name:Shi Epoxidation Oxazolidinone Methyl Catalyst
CAS No.:403501-30-4
Molecular Formula:C₁₇H₁₉NO₆
Molecular Weight:333.341
Hs Code.:
DSSTox Substance ID:DTXSID00467912
Nikkaji Number:J1.875.082A
Wikidata:Q82295000
Mol file:403501-30-4.mol

Synonyms:403501-30-4;Shi Epoxidation Oxazolidinone Methyl Catalyst;(3A'R,5S,7a'R)-2',2'-dimethyl-3-(p-tolyl)dihydrospiro[oxazolidine-5,6'-[1,3]dioxolo[4,5-c]pyran]-2,7'(4'H)-dione;starbld0005560;DTXSID00467912;Shi epoxidation oxazolidinone methyl catalyst,95%;SHI EPOXIDATION OXAZOLIDINONE METHYL CATALYST, 95%;(3'aR,5S,7'aR)-2',2'-dimethyl-3-(4-methylphenyl)spiro[1,3-oxazolidine-5,6'-4,7a-dihydro-3aH-[1,3]dioxolo[4,5-c]pyran]-2,7'-dione

Suppliers and Price of Shi Epoxidation Oxazolidinone Methyl Catalyst

Supply Marketing:

Business phase:: The product has achieved commercial mass production^*data from LookChem market partment

Manufacturers and distributors:

Manufacture/Brand
Chemicals and raw materials
Packaging
price

Sigma-Aldrich
Shi Epoxidation Oxazolidinone Methyl Catalyst 95%
500mg
$ 493.00

Sigma-Aldrich
Shi Epoxidation Oxazolidinone Methyl Catalyst 95%
100mg
$ 165.00

American Custom Chemicals Corporation
SHI EPOXIDATION OXAZOLIDINONE METHYL CATALYST 95.00%
500MG
$ 951.41

American Custom Chemicals Corporation
SHI EPOXIDATION OXAZOLIDINONE METHYL CATALYST 95.00%
100MG
$ 680.96

Total 2 raw suppliers

Chemical Property of Shi Epoxidation Oxazolidinone Methyl Catalyst

Chemical Property:

Melting Point:149-154 °C
PSA：74.30000
LogP:1.83230
Storage Temp.:2-8°C
XLogP3:1.6
Hydrogen Bond Donor Count:0
Hydrogen Bond Acceptor Count:6
Rotatable Bond Count:1
Exact Mass:333.12123733
Heavy Atom Count:24
Complexity:555

Purity/Quality:

98%+ ^*data from raw suppliers

Shi Epoxidation Oxazolidinone Methyl Catalyst 95% ^*data from reagent suppliers

Safty Information:

Pictogram(s):
Hazard Codes:
Safety Statements: 36/37

MSDS Files:

SDS file from LookChem

Total 1 MSDS from other Authors

Useful:

Canonical SMILES:CC1=CC=C(C=C1)N2CC3(C(=O)C4C(CO3)OC(O4)(C)C)OC2=O
Isomeric SMILES:CC1=CC=C(C=C1)N2C[C@@]3(C(=O)[C@H]4[C@@H](CO3)OC(O4)(C)C)OC2=O
Uses Asymmetric epoxidation organocatalyst

Technology Process of Shi Epoxidation Oxazolidinone Methyl Catalyst

There total 7 articles about Shi Epoxidation Oxazolidinone Methyl Catalyst which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:

Reference yield: 72.0%

: 403501-14-4
C₁₇H₂₁NO₆

: 403501-30-4
C₁₇H₁₉NO₆

Guidance literature:: With dipyridinium dichromate; acetic acid; In dichloromethane; at 20 ℃;
DOI:10.1021/ol020229e

Reference yield:

: 2280-44-6
D-Glucose

: 403501-30-4
C₁₇H₁₉NO₆

Guidance literature:: Multi-step reaction with 4 steps

1: 64 percent / acetic acid / H₂O / 2 h / 90 - 93 °C

2: sulfuric acid / acetone / 0.75 h / 0 °C

3: 72 percent / NaHCO₃; diisopropylamine / CH₂Cl₂; toluene / cooling

4: 21.7 percent / NaOCl; NaBr; 2,2,6,6-tetramethyl-1-piperidinyloxy / CH₂Cl₂; toluene / 4 - 8 °C / pH 9.3

With 2,2,6,6-tetramethyl-piperidine-N-oxyl; sodium hypochlorite; sulfuric acid; sodium hydrogencarbonate; acetic acid; diisopropylamine; sodium bromide; In dichloromethane; water; acetone; toluene;
DOI:10.1016/j.tet.2006.06.020

Reference yield:

: 35094-21-4
(2R,3S,4R,5R)-2-((p-toluidino)methyl)-tetrahydro-2H-pyran-2,3,4,5-tetraol

: 403501-30-4
C₁₇H₁₉NO₆

Guidance literature:: Multi-step reaction with 3 steps

1: sulfuric acid / acetone / 0.75 h / 0 °C

2: 72 percent / NaHCO₃; diisopropylamine / CH₂Cl₂; toluene / cooling

3: 21.7 percent / NaOCl; NaBr; 2,2,6,6-tetramethyl-1-piperidinyloxy / CH₂Cl₂; toluene / 4 - 8 °C / pH 9.3

With 2,2,6,6-tetramethyl-piperidine-N-oxyl; sodium hypochlorite; sulfuric acid; sodium hydrogencarbonate; diisopropylamine; sodium bromide; In dichloromethane; acetone; toluene;
DOI:10.1016/j.tet.2006.06.020