Technology Process of (2R,3S)-2-(tert-butyldiphenylsilyl)oxy-3,4-epoxy-3-methylbutanal
There total 7 articles about (2R,3S)-2-(tert-butyldiphenylsilyl)oxy-3,4-epoxy-3-methylbutanal which
guide to synthetic route it.
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synthetic route:
- Guidance literature:
-
Multi-step reaction with 6 steps
1: 48.22 g / triethylamine; 4-(dimethylamino)pyridine / CH2Cl2 / 20 °C
2: 91 percent / LDA / tetrahydrofuran; hexane / 6 h / -60 - 20 °C
3: 70 percent / titanium tetra-iso-propoxide; di-iso-propyl D-tartrate; t-butyl hydroperoxide / CH2Cl2 / -20 °C
4: 82 percent / imidazole; 4-(dimethylamino)pyridine / dimethylformamide / 20 °C
5: 73 percent / AcOH / H2O / 3 h / 50 °C
6: 91 percent / Dess-Martin periodinane / CH2Cl2 / 1 h / 20 °C
With
1H-imidazole; titanium(IV) isopropylate; tert.-butylhydroperoxide; dmap; Dess-Martin periodane; acetic acid; diisopropyl-d0 D-tartrate; triethylamine; lithium diisopropyl amide;
In
tetrahydrofuran; hexane; dichloromethane; water; N,N-dimethyl-formamide;
3: Sharpless asymmetric epoxidation / 6: Dess-Martin oxidation;
DOI:10.1016/S0957-4166(01)00149-5
- Guidance literature:
-
Multi-step reaction with 7 steps
1: titanium tetra-iso-propoxide; diethyl D-tartrate; t-butyl hydroperoxide / CH2Cl2 / 2 h / -20 °C
2: 48.22 g / triethylamine; 4-(dimethylamino)pyridine / CH2Cl2 / 20 °C
3: 91 percent / LDA / tetrahydrofuran; hexane / 6 h / -60 - 20 °C
4: 70 percent / titanium tetra-iso-propoxide; di-iso-propyl D-tartrate; t-butyl hydroperoxide / CH2Cl2 / -20 °C
5: 82 percent / imidazole; 4-(dimethylamino)pyridine / dimethylformamide / 20 °C
6: 73 percent / AcOH / H2O / 3 h / 50 °C
7: 91 percent / Dess-Martin periodinane / CH2Cl2 / 1 h / 20 °C
With
1H-imidazole; titanium(IV) isopropylate; tert.-butylhydroperoxide; dmap; diethyl (2S,3S)-tartrate; Dess-Martin periodane; acetic acid; diisopropyl-d0 D-tartrate; triethylamine; lithium diisopropyl amide;
In
tetrahydrofuran; hexane; dichloromethane; water; N,N-dimethyl-formamide;
1: Sharpless asymmetric epoxidation / 4: Sharpless asymmetric epoxidation / 7: Dess-Martin oxidation;
DOI:10.1016/S0957-4166(01)00149-5
