Multi-step reaction with 13 steps
1: 93 percent / (COCl)2, DMSO, Et3N / CH2Cl2 / 1.) -78 deg C, 30 min, 2.) 0 deg C, 40 min
2: 1.) n-BuLi / 1.) THF, hexane, RT, 30 min, 2.) THF, hexane, RT, 6 h
3: 91 percent / aq. AcOH / tetrahydrofuran / 3 h / 60 °C
4: 88 percent / Et3N, DMAP / CH2Cl2 / 3 h / Ambient temperature
5: 90 percent / DCC, DMAP / CH2Cl2 / 48 h / Ambient temperature
6: 1.) TBSCl, LDA, HMPA / 1.) THF, -78 deg C, 10 min, 2.) THF, a) RT, 30 min, b) reflux, 2.5 h
7: 86 percent / LiAlH4 / tetrahydrofuran / 0.5 h / Ambient temperature
8: 98 percent / Et3N / CH2Cl2 / 0.5 h / 0 °C
9: NaI / acetone / 48 h / Heating
10: dimethylformamide / 15 h / 80 °C
11: 1.) n-BuLi / 1.) THF, hexane, -78 deg C, 10 min, 2.) THF, hexane, -78 deg C, 2.5 h
12: 74 percent / (COCl)2, DMSO, Et3N / CH2Cl2 / 1.) -78 deg C, 1 h, 2.) 0 deg C, 2.5 h
13: 77 percent / Bu3SnH, AIBN / toluene / 5 h / Heating
With
N,N,N,N,N,N-hexamethylphosphoric triamide; dmap; lithium aluminium tetrahydride; n-butyllithium; oxalyl dichloride; 2,2'-azobis(isobutyronitrile); tri-n-butyl-tin hydride; tert-butyldimethylsilyl chloride; acetic acid; dimethyl sulfoxide; triethylamine; dicyclohexyl-carbodiimide; sodium iodide; lithium diisopropyl amide;
In
tetrahydrofuran; dichloromethane; N,N-dimethyl-formamide; acetone; toluene;
DOI:10.1016/S0957-4166(96)00445-4