10112-08-0 Usage
General Description
(Fuoromethyl)silane is a chemical compound with the formula CH3SiF3. It is a colorless, flammable gas with a pungent odor and is typically used as a reagent in organic synthesis, particularly for the introduction of the trimethylsilyl group. It is also utilized as a precursor for the deposition of silicon-based thin films in microelectronics and as a source of fluorine for plasma etching in semiconductor manufacturing. Additionally, (fluoromethyl)silane is considered to be a hazardous chemical due to its flammability and potential for causing respiratory irritation, and should be handled with caution in a controlled laboratory or industrial setting.
Check Digit Verification of cas no
The CAS Registry Mumber 10112-08-0 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,0,1,1 and 2 respectively; the second part has 2 digits, 0 and 8 respectively.
Calculate Digit Verification of CAS Registry Number 10112-08:
(7*1)+(6*0)+(5*1)+(4*1)+(3*2)+(2*0)+(1*8)=30
30 % 10 = 0
So 10112-08-0 is a valid CAS Registry Number.
10112-08-0Relevant articles and documents
The synthesis and properties of (CH2F)SiH3 and related monofluoromethylsilanes
Buerger, H.,Moritz, P.
, p. 293 - 308 (2007/10/02)
The reduction of (CFCl2)SiCl3 by LiAlH4, Me3SnH, and (nBu)3SnH has been studied.The compound (CH2F)SiH3 (I) and all the compounds of the series (CFCl2-mHm)SiCl3-nHn, m = 0, 1 and n = 0-3 were detected and characterized by NMR spectroscopy.Conditions for the synthesis of I, (CHFCl)SiH3 (IX) and (CFCl2)SiH3 (V) with acceptable yields have been optimized.These novel compounds were studied by 1H, 19F, 13C and 29Si NMR spectroscopy; their infrared and Raman spectra were recorded and assigned with the assistance of a normal coordinate analysis of 1 and its isotopomer (CD2F)SiD3.The thermolyses of I, IX and (CHF2)SiH3 (X) which start at about 120, 200 and 180 deg C, respectively, have been studied.Whereas I decomposes by a migration of F from C to Si, compound X undergoes elimination of the carbene CHF, insertion of which into SiH bonds ultimately gives CH3Si derivatives.
