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10112-10-4

10112-10-4

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10112-10-4 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 10112-10-4 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,0,1,1 and 2 respectively; the second part has 2 digits, 1 and 0 respectively.
Calculate Digit Verification of CAS Registry Number 10112-10:
(7*1)+(6*0)+(5*1)+(4*1)+(3*2)+(2*1)+(1*0)=24
24 % 10 = 4
So 10112-10-4 is a valid CAS Registry Number.

10112-10-4SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 15, 2017

Revision Date: Aug 15, 2017

1.Identification

1.1 GHS Product identifier

Product name (difluoromethyl)silane

1.2 Other means of identification

Product number -
Other names difluoromethylsilane

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:10112-10-4 SDS

10112-10-4Upstream product

10112-10-4Relevant articles and documents

The synthesis and properties of (CH2F)SiH3 and related monofluoromethylsilanes

Buerger, H.,Moritz, P.

, p. 293 - 308 (2007/10/02)

The reduction of (CFCl2)SiCl3 by LiAlH4, Me3SnH, and (nBu)3SnH has been studied.The compound (CH2F)SiH3 (I) and all the compounds of the series (CFCl2-mHm)SiCl3-nHn, m = 0, 1 and n = 0-3 were detected and characterized by NMR spectroscopy.Conditions for the synthesis of I, (CHFCl)SiH3 (IX) and (CFCl2)SiH3 (V) with acceptable yields have been optimized.These novel compounds were studied by 1H, 19F, 13C and 29Si NMR spectroscopy; their infrared and Raman spectra were recorded and assigned with the assistance of a normal coordinate analysis of 1 and its isotopomer (CD2F)SiD3.The thermolyses of I, IX and (CHF2)SiH3 (X) which start at about 120, 200 and 180 deg C, respectively, have been studied.Whereas I decomposes by a migration of F from C to Si, compound X undergoes elimination of the carbene CHF, insertion of which into SiH bonds ultimately gives CH3Si derivatives.

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