101252-92-0Relevant articles and documents
Photoresist resin monomer containing five-membered ring-shaped beta-ketone structure and synthesis method thereof
-
Paragraph 0051; 0056-0059, (2020/06/02)
The invention discloses a photoresist resin monomer containing a five-membered ring-shaped beta-ketone structure and a synthesis method thereof, belonging to the fields of chemical synthesis and photoetching materials. The photoresist resin monomer has a structural general formula which is described in the specification. In the structural general formula, R1 is methyl or hydrogen; R2 and R3 are respectively and independently one selected from the group consisting of hydrogen, alkyl and cycloalkyl; R4 is alkyl or cycloalkyl; n is an integer which is no less than 1; and R' is one selected from the group consisting of hydrogen, alkyl and cycloalkyl. The photoresist resin monomer has the characteristic of large solubility difference before and after exposure, can reduce the roughness and improve the sensitivity and the resolution ratio, and facilitates forming a photoetching pattern with good uniformity.
