110874-17-4Relevant academic research and scientific papers
PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN
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Page/Page column 43-44, (2012/11/07)
A photoresist composition comprising (A) a resin which has an acid-labile group-containing structural unit and a lactone ring-containing structural unit, and(B) a salt represented by formula (I): wherein Q1 and Q2 each independently
SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN
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Page/Page column 45-46, (2013/02/28)
A salt represented by formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, n represents 0 or 1, Ll represents a single bond or a C1-C10 alkanediyl group in which a me
