1402933-04-3

Upstream product

• 5421-53-4 4,4'-Di-tert-butyldiphenyliodonium chloride 
• 84454-62-6 5-carbomethoxyadamantan-2-one ethylene ketal 
• 1379588-15-4 C₁₄H₁₆N₂O₂ 
• 110874-17-4 C₁₁H₁₆O₂ 
• 1402933-03-2 C₅H₃F₂N₂O₄S^(1-)*C₂₀H₂₆I⁽¹⁺⁾ 
• 1402933-02-1 C₂HF₂O₅S^(1-)*C₂₀H₂₆I⁽¹⁺⁾ 
• 56674-87-4 4-oxoadamantane-1-carboxylic acid 
• 56674-88-5 methyl 4-oxoadamantane-1-carboxylate 

Downstream Products

• 1402933-05-4 C₁₃H₁₇F₂O₆S^(1-)*C₂₀H₂₆I⁽¹⁺⁾ 
• 1402933-06-5 C₁₃H₁₇F₂O₆S^(1-)*C₁₄H₂₁OS⁽¹⁺⁾ 

Relevant academic research and scientific papers

A salt, an acid generating agent, the composition and production of resist pattern (by machine translation)

[A] producing a good CD uniformity of the resist pattern can be a salt, an acid generating agent containing the same and to resist composition. (I) a salt represented by the formula [a], an acid generating agent and resist composition. [In the formula, Q

Salt, resist composition and a manufacturing method of a resist pattern (by machine translation)

The present invention provides a salt represented by the formula (I): wherein R1, R2, L1, Y, R3, R4, R5, R6, R7, n, s, and R8 represent variables outlined in the specification.

COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern with little defects and a good profile can be produced. SOLUTION: A resin having a structural unit derived from a compound having a group represented by formula (Ia) is provided; and the resist composition includes the resin. In formula (Ia), R1 and R2 each independently represent a 1-8C fluorinated alkyl group; W represents a substituted/unsubstituted 5-18C alicyclic hydrocarbon group; * represents a group having an olefin moiety comprising a halogen substituted/unsubstituted 1-6C alkyl group connected via a single bond or a substituted/unsubstituted 1-10C saturated hydrocarbon group; and W represents a cyclohexanetriyl group, an adamantanetriyl group or a norbornantriyl group. SELECTED DRAWING: None COPYRIGHT: (C)2016,JPOandINPIT

SALT, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

PROBLEM TO BE SOLVED: To provide a salt for an acid generator which is used for a resist composition capable of producing a resist pattern with excellent CD uniformity (CDU). SOLUTION: The salt is represented by formula (I0). [In the formula (I0), R1

SALT, RESIST COMPOSITION, AND PRODUCTION METHOD OF RESIST PATTERN

PROBLEM TO BE SOLVED: To provide a salt and a resist composition from which a resist pattern with high CD uniformity can be produced. SOLUTION: The salt is represented by formula (I). In formula (I), Q1 and Q2 each independently repr

SALT, ACID GENERATOR, RESIST COMPOSITION, AND PRODUCTION METHOD OF RESIST PATTERN

PROBLEM TO BE SOLVED: To provide a salt from which a resist pattern with a good focus margin can be produced. SOLUTION: The salt has a group represented by formula (I1). In formula (I1), R1 represents a hydrogen atom or a 1-24C hydrocarbon grou

PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN

A photoresist composition comprising (A) a resin which has an acid-labile group-containing structural unit and a lactone ring-containing structural unit, and(B) a salt represented by formula (I): wherein Q1 and Q2 each independently