1126206-31-2Relevant academic research and scientific papers
POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
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, (2010/04/23)
A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R1 is H, F, methyl or trifluoromethyl, R2, R3 and R4 are C1-C10 alkyl, alkenyl or oxoalkyl or C6-C18 aryl, aralkyl or aryloxoalkyl, or two of R2, R3 and R4 may bond together to form a ring with S, A is a C1-C10 organic group, and n is 0 or 1. The sulfonium salt generates a very strong sulfonic acid upon exposure to high-energy radiation. A resist composition comprising a polymer derived from the sulfonium salt is also provided.
NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS
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, (2009/04/24)
Photoacid generators generate sulfonic acids of formula (1a) or (1c) upon exposure to high-energy radiation. [in-line-formulae]R1—COOCH(CF3)CF2SO3+H+??(1a)[/in-line-formulae] [in-line-formulae]R1—O—COOCH(CF3)CF2SO3?H+??(1c)[/in-line-formulae] R1 is a C20-C50 hydrocarbon group having a steroid structure. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.
Movel photoacid generators, resist compositons, and patterning processes
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Page/Page column 73-74, (2009/04/23)
Photoacid generators generate sulfonic acids of formula (1a) or (1c) upon exposure to high-energy radiation. ????????R1-COOCH(CF3)CF2SO3-H+?????(1a) ????????R1-O-COOCH(CF3)CF2SO3-H+?????(1c) R1 is a C20-C50 hydrocarbon group having a steroid structure. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.
