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Benzenethiol, 4-butoxy-, also known as 4-butoxybenzenethiol or 4-butylphenyl methyl sulfide, is an organic compound with the chemical formula C10H14OS. It is a colorless to pale yellow liquid with a strong, unpleasant odor. Benzenethiol, 4-butoxy- is primarily used as a synthetic intermediate in the production of pharmaceuticals, agrochemicals, and other organic compounds. It is also employed as a fragrance ingredient in the perfume industry. Benzenethiol, 4-butoxy-, is characterized by its molecular weight of 178.28 g/mol and a boiling point of approximately 270°C. Due to its reactive nature, it is essential to handle this chemical with care, following proper safety guidelines and precautions.

1129-79-9

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1129-79-9 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 1129-79-9 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 1,1,2 and 9 respectively; the second part has 2 digits, 7 and 9 respectively.
Calculate Digit Verification of CAS Registry Number 1129-79:
(6*1)+(5*1)+(4*2)+(3*9)+(2*7)+(1*9)=69
69 % 10 = 9
So 1129-79-9 is a valid CAS Registry Number.

1129-79-9SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 17, 2017

Revision Date: Aug 17, 2017

1.Identification

1.1 GHS Product identifier

Product name p-Butoxythiophenol

1.2 Other means of identification

Product number -
Other names .4-Butyloxy-thiophenol

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:1129-79-9 SDS

1129-79-9Upstream product

1129-79-9Relevant academic research and scientific papers

Novel sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning process

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, (2008/06/13)

A chemical amplification type resist composition contains as a photoacid generator a sulfonyldiazomethane compound of formula (1) wherein R is H or C1-4 alkyl or alkoxy, G is SO2 or CO, R3 is C1-10 alkyl or Csu

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