114438-52-7Relevant academic research and scientific papers
RADICAL POLYMERIZATION INITIATOR AND METHOD FOR PRODUCING POLYMERS
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Paragraph 0147-0151, (2016/10/31)
The present invention involves a radical polymerization initiator comprising an organotellurium compound represented by a formula (1), wherein R1 represents an alkyl group or the like, each of R2 and R3 independently represents a hydrogen atom or the like, and each of R4, R5, and R6 independently represents a hydrogen atom or the like. The present invention provides: a radical polymerization initiator that is useful for producing a polymer that includes a double bond at the molecular terminal; and a method for producing a polymer that utilizes the radical polymerization initiator.
Reaction of 1-bromo-3-chloropropane with tellur and dimethyltelluride in the system of hydrazine hydrate-alkali
Russavskaya,Levanova,Sukhomazova,Grabelnykh,Elaev,Klyba,Zhanchipova,Albanov,Korotaeva,Totyashinova,Korchevin
, p. 726 - 729 (2008/02/02)
A synthesis of oligomeric substance of thiocol type, the poly(trimethyleneditelluride), from 1-bromo-3-chloropropane and elemental tellurium is performed using a hydrazine hydrate-alkali system. Reductive splitting of the tellurocol followed by alkylation with methyl iodide give rise to preparation of bis(methyltelluro)propane, which was synthesized also from dimethyltelluride and 1,3-dihalopropanes using the N2H 4?H2O/KOH system. Mass spectra of the synthesized low molecular weight organotellurium compounds are considered. Pleiades Publishing, Inc., 2006.
Method for preparation of organo-tellurium and selenium compounds
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, (2008/06/13)
Methods for the preparation of a tellurium or selenium compound of formula Ra M Rb wherein M is tellurium or selenium and Ra and Rb are different C1-20 alkyl, alkenyl or aryl groups are provided in which a compound of formula (Ra)2 M2 is reacted with a compound of formula (Rb)2 M in each compound M being the same. Compounds of formula RaMMRb may also be isolated as an intermediate. Ra M Rb compounds are useful as precursors for metal organic vapor phase epitaxy processes.
Allyltellurides and their use in the MOCVD growth of group II-VI epitaxial films
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, (2008/06/13)
Methyl allyltelluride is described for use in a process for depositing group II-VI epitaxial films in semiconductor manufacture. The films are grown on crys-talline substrates in a MOCVD reactor.
