12033-62-4

Basic information

• Product Name: TANTALUM NITRIDE
• Synonyms: TANTALUM NITRIDE;tantalumnitride(tan);tantalum mononitride;TANTALUM NITRIDE, ;TANTALUM NITRIDE, 99.5% (METALS BASIS);Einecs 234-788-4;Tantalum nitride, 99.5% trace metals basis;Tantalum Nitride , powder (TaN)
• CAS NO: 12033-62-4
• Molecular Formula: NTa
• Molecular Weight: 194.95
• EINECS: 234-788-4
• Product Categories: Inorganics;Ceramics;Metal and Ceramic Science;Nitrides
• Mol File: 12033-62-4.mol

Chemical Properties

• Melting Point: 3360°C
• Boiling Point: °Cat760mmHg
• Flash Point: °C
• Appearance: /Powder
• Density: 14.6 g/cm3
• Water Solubility: Insoluble in water.
• CAS DataBase Reference: TANTALUM NITRIDE(CAS DataBase Reference)
• NIST Chemistry Reference: TANTALUM NITRIDE(12033-62-4)
• EPA Substance Registry System: TANTALUM NITRIDE(12033-62-4)

Safety Data

• WGK Germany: 3
• TSCA: Yes
• Hazardous Substances Data: 12033-62-4(Hazardous Substances Data)

Usage

Chemical Properties

Hexagonal, brown, bronze, or black crystals. Insoluble in water; slightly soluble in aqua regia, nitric acid, hydrogen fluoride.

Uses

Tantalum nitride is used to create barrier or "glue" layers between copper, or other conductive metals, and dielectric insulator films such as thermal oxides. These films are deposited on top of silicon wafers during the manufacture of integrated circuits, to create thin film surface mount resistors and has other electronic applications.

Production Methods

Tantalum nitride, TaN, is produced by direct synthesis of the elements at 1,100 °C (2,012 °F). Very pure TaN has been produced by spontaneous reaction of lithium amide, LiNH2, and TaCl5 . The compound is often added to cermets in 3–18 wt %. Ta3N5 is used as a red pigment in plastics and paints.

InChI:InChI=1/5N.3Ta/q5*-3;3*+5

Upstream product

• 120336-11-0 2,3,4,5-tetrahydro-1H-indolo[3,2,1-de][1,5]naphthyridine-6,9-dione 
• 12033-60-2 silicon nitride 
• 12033-59-9 Nitrogen selenide (NSe)(9CI) 
• 12033-56-6 thioxoamino 
• 12033-54-4 PLUTONIUMNITRIDE 
• 12033-49-7 nitric acid 
• 12033-47-5 1,3,2,4-oxazadisiletidine 
• 12033-40-8 MOLYBDENUM SILICIDE 
• 120333-55-3 1H-Azeto[1,2-a]pyrrolo[3,4-c]pyrrole(9CI) 
• 12033-31-7 MOLYBDENUM NITRIDE 
• 1203329-44-5 N-((5-Aminopyridin-2-yl)methyl)acetamide 
• 12033-29-3 MOLYBDENUM TRISULFIDE 
• 120332-82-3 2-AMINO-3-CYANOISOQUINOLINIUM 
• 1203324-68-8 4-Cholor-6-bromo-1H-thieno[3,2-D]pyrimidine 

Downstream Products

• 120336-45-0 HEXAKIS-(2,6-DI-O-PENTYL)-ALPHA-CYCLODEXTRIN 
• 12033-64-6 terbium nitride 
• 120336-54-1 diphenylhexatrienylpropanoylhydrazylstachyose 
• 12033-65-7 Thorium nitride. 
• 1203-36-7 2-METHYL-4,5,8-TRICHLOROQUINOLINE 
• 12033-68-0 THULIUM NITRIDE 
• 120336-94-9 MC 969 
• 120336-96-1 4-METHYL-N-(4-METHYL-BENZOYL)-BENZENESULFONAMIDE 
• 1203372-02-4 7-Bromomethylisoquinoline hydrobromide 
• 120337-25-9 5-acetyl-1-ethyl-1,3,4,5-tetrahydro-2H-1,5-benzodiazepin-2-one 
• 12033-72-6 ditungsten nitride 
• 120337-30-6 5-acetyl-1-(prop-2-en-1-yl)-1,3,4,5-tetrahydro-2H-1,5-benzodiazepin-2-one 
• 120337-33-9 1-ethyl-1,3,4,5-tetrahydro-2H-1,5-benzodiazepin-2-one 
• 120337-34-0 1-(prop-2-en-1-yl)-1,3,4,5-tetrahydro-2H-1,5-benzodiazepin-2-one 

Related news

Effect of texture on wear resistance of TANTALUM NITRIDE (cas 12033-62-4) film07/29/2019

The δ-TaN films were fabricated through reactive magnetron sputtering deposition technique onto WC-Co substrate. The texture of δ-TaN films can be tuned by adjusting the sputtering power and working gas pressure to vary the ion energy and mobility of particles. The underdense structure observe...detailed

Nitrogen transfer properties in TANTALUM NITRIDE (cas 12033-62-4) based materials07/28/2019

Ta3-xMxNy (M = Re, Fe, Co; x = 0, 0.25, 0.5, 1) materials with different microstructural features (e.g. surface area) were successfully prepared using different synthesis techniques. The dependence of nitrogen transfer properties upon tantalum nitride microstructure and its chemical composition ...detailed

Development and analysis of TANTALUM NITRIDE (cas 12033-62-4) coatings prepared by DC reactive sputtering07/27/2019

The objective of the present work is to investigate the effect of DC power variation on structural, wettability and tribological properties of tantalum nitride coatings deposited by DC reactive magnetron sputtering. The X-ray diffraction graphs of tantalum nitride coating show evolution of vario...detailed

Characterization of tantalum and TANTALUM NITRIDE (cas 12033-62-4) films on Ti6Al4V substrate prepared by filtered cathodic vacuum arc deposition for biomedical applications07/26/2019

This paper explores tantalum and tantalum nitride thin films produced by filtered cathodic vacuum arc deposition method as bio-stable surface treatment for Ti6Al4V titanium alloy. Effect of nitrogen to argon gas ratio on microstructure of the deposited film has been investigated. Corrosion behav...detailed