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Tantalum nitride
Cas No: 12033-62-4
USD $ 3.0-3.0 / Kilogram 1 Kilogram 1-100 Metric Ton/Month Dayang Chem (Hangzhou) Co.,Ltd. Contact Supplier
Tantalum nitride
Cas No: 12033-62-4
USD $ 1.2-5.0 / Kiloliter 5 Kiloliter 3000 Metric Ton/Month Chemwill Asia Co., Ltd. Contact Supplier
tantalum nitride Cas no.12033-62-4 98%
Cas No: 12033-62-4
No Data 1 Metric Ton 100kg+ Metric Ton/Day Win-Win chemical Co.Ltd Contact Supplier
Pharmaceutical Grade CAS 12033-62-4 with competitive price
Cas No: 12033-62-4
USD $ 139.0-210.0 / Kilogram 1 Kilogram 1000 Kilogram/Day Zhuozhou Wenxi import and Export Co., Ltd Contact Supplier
tantalum nitride;TANTALUM NITRIDE;
Cas No: 12033-62-4
No Data 1 Metric Ton 5 Metric Ton/Day Hangzhou Sartort Biopharma Co., Ltd Contact Supplier
Tantalum nitride (TaN)
Cas No: 12033-62-4
No Data 1 Gram 10000 Metric Ton/Month Shanghai Upbio Tech Co.,Ltd Contact Supplier
Tantalum nitride (TaN)
Cas No: 12033-62-4
No Data No Data 10000 Metric Ton/Month Henan Wentao Chemical Product Co., Ltd. Contact Supplier
Tantalum nitride (TaN)
Cas No: 12033-62-4
No Data No Data 5 Hangzhou J&H Chemical Co., Ltd. Contact Supplier
Factory Supply tantalum nitride
Cas No: 12033-62-4
No Data No Data No Data Ality Chemical Corporation Contact Supplier
Tantalum nitride
Cas No: 12033-62-4
No Data 1 Kilogram 1 Metric Ton/Day Henan Kanbei Chemical Co.,LTD Contact Supplier

12033-62-4 Usage

Chemical Properties

Hexagonal, brown, bronze, or black crystals. Insoluble in water; slightly soluble in aqua regia, nitric acid, hydrogen fluoride.


Tantalum nitride is used to create barrier or "glue" layers between copper, or other conductive metals, and dielectric insulator films such as thermal oxides. These films are deposited on top of silicon wafers during the manufacture of integrated circuits, to create thin film surface mount resistors and has other electronic applications.

Production Methods

Tantalum nitride, TaN, is produced by direct synthesis of the elements at 1,100 °C (2,012 °F). Very pure TaN has been produced by spontaneous reaction of lithium amide, LiNH2, and TaCl5 . The compound is often added to cermets in 3–18 wt %. Ta3N5 is used as a red pigment in plastics and paints.

Check Digit Verification of cas no

The CAS Registry Mumber 12033-62-4 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,2,0,3 and 3 respectively; the second part has 2 digits, 6 and 2 respectively.
Calculate Digit Verification of CAS Registry Number 12033-62:
54 % 10 = 4
So 12033-62-4 is a valid CAS Registry Number.

12033-62-4 Well-known Company Product Price

Brand (Code)Product description CAS number Packaging Price Detail
Alfa Aesar (13093)  Tantalum nitride, 99.5% (metals basis)    12033-62-4 10g 319.0CNY Detail
Alfa Aesar (13093)  Tantalum nitride, 99.5% (metals basis)    12033-62-4 50g 1351.0CNY Detail



According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 17, 2017

Revision Date: Aug 17, 2017


1.1 GHS Product identifier

Product name azanylidynetantalum

1.2 Other means of identification

Product number -
Other names Tantalum mononitride

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:12033-62-4 SDS

12033-62-4Related news

Effect of texture on wear resistance of TANTALUM NITRIDE (cas 12033-62-4) film07/29/2019

The δ-TaN films were fabricated through reactive magnetron sputtering deposition technique onto WC-Co substrate. The texture of δ-TaN films can be tuned by adjusting the sputtering power and working gas pressure to vary the ion energy and mobility of particles. The underdense structure observe...detailed

Nitrogen transfer properties in TANTALUM NITRIDE (cas 12033-62-4) based materials07/28/2019

Ta3-xMxNy (M = Re, Fe, Co; x = 0, 0.25, 0.5, 1) materials with different microstructural features (e.g. surface area) were successfully prepared using different synthesis techniques. The dependence of nitrogen transfer properties upon tantalum nitride microstructure and its chemical composition ...detailed

Development and analysis of TANTALUM NITRIDE (cas 12033-62-4) coatings prepared by DC reactive sputtering07/27/2019

The objective of the present work is to investigate the effect of DC power variation on structural, wettability and tribological properties of tantalum nitride coatings deposited by DC reactive magnetron sputtering. The X-ray diffraction graphs of tantalum nitride coating show evolution of vario...detailed

Characterization of tantalum and TANTALUM NITRIDE (cas 12033-62-4) films on Ti6Al4V substrate prepared by filtered cathodic vacuum arc deposition for biomedical applications07/26/2019

This paper explores tantalum and tantalum nitride thin films produced by filtered cathodic vacuum arc deposition method as bio-stable surface treatment for Ti6Al4V titanium alloy. Effect of nitrogen to argon gas ratio on microstructure of the deposited film has been investigated. Corrosion behav...detailed

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