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12159-07-8

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12159-07-8 Usage

Chemical Properties

6.35mm and down pieces [ALF93]

Uses

Copper silicide?thin film?is used for?passivation?of?copper-based chips, where it serves to suppress?diffusion?and?electromigration?and serves as a?diffusion barrier. It is involved in the direct process, the industrial route to organosilicon compounds.

Check Digit Verification of cas no

The CAS Registry Mumber 12159-07-8 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,2,1,5 and 9 respectively; the second part has 2 digits, 0 and 7 respectively.
Calculate Digit Verification of CAS Registry Number 12159-07:
(7*1)+(6*2)+(5*1)+(4*5)+(3*9)+(2*0)+(1*7)=78
78 % 10 = 8
So 12159-07-8 is a valid CAS Registry Number.
InChI:InChI=1/5Cu.Si

12159-07-8 Well-known Company Product Price

  • Brand
  • (Code)Product description
  • CAS number
  • Packaging
  • Price
  • Detail
  • Alfa Aesar

  • (12844)  Copper silicide, 99.5% (metals basis)   

  • 12159-07-8

  • 25g

  • 858.0CNY

  • Detail
  • Alfa Aesar

  • (12844)  Copper silicide, 99.5% (metals basis)   

  • 12159-07-8

  • 100g

  • 2794.0CNY

  • Detail

12159-07-8SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 17, 2017

Revision Date: Aug 17, 2017

1.Identification

1.1 GHS Product identifier

Product name COPPER SILICIDE

1.2 Other means of identification

Product number -
Other names coppersilicide(cu5si)

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:12159-07-8 SDS

12159-07-8Upstream product

12159-07-8Downstream Products

12159-07-8Related news

Coverage-driven phase transition of COPPER SILICIDE (cas 12159-07-8) monolayer on Si (111)07/30/2019

The characterization and control of atomic substitution process is crucial in fabricating high-quality two-dimensional layered compound materials and tuning their physical properties. With intensity-voltage low energy electron microscopy (IV-LEEM), we found that the concentration of copper in th...detailed

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