1264173-46-7

Upstream product

• 912289-98-6 difluorosulfoacetic acid sodium salt 
• 22417-22-7 tris(4-methylphenyl)sulfonium chloride 

Downstream Products

• 1329674-59-0 C₅H₃F₂N₂O₄S^(1-)*C₂₁H₂₁S⁽¹⁺⁾ 
• 1403353-99-0 C₂₁H₂₁S⁽¹⁺⁾*C₂₄H₃₁F₂O₈S^(1-) 
• 1233844-91-1 C₁₂H₁₃F₂O₆S^(1-)*C₂₁H₂₁S⁽¹⁺⁾ 
• 1403964-77-1 C₁₃H₁₇F₂O₆S^(1-)*C₂₁H₂₁S⁽¹⁺⁾ 
• 1403964-76-0 C₁₇H₂₅F₂O₇S^(1-)*C₂₁H₂₁S⁽¹⁺⁾ 
• 1402933-01-0 C₁₃H₁₇F₂O₆S^(1-)*C₂₁H₂₁S⁽¹⁺⁾ 
• 1402933-00-9 C₁₃H₁₅F₂O₆S^(1-)*C₂₁H₂₁S⁽¹⁺⁾ 

Relevant academic research and scientific papers

Salt and resist compsn.

PROBLEM TO BE SOLVED: To provide a salt for the acid-generating agents of resist compositions formable of patterns having excellent line edge roughness.SOLUTION: There is provided the salt represented by formula (I) (wherein, Rand Rare each independently

SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN

A salt represented by formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which a methylene group may