1264173-48-9

Upstream product

• 912289-98-6 difluorosulfoacetic acid sodium salt 
• 74275-85-7 Tetramethylenphenacylsulfoniumchlorid 

Downstream Products

• 1403964-80-6 C₁₂H₁₅OS⁽¹⁺⁾*C₁₃H₁₇F₂O₆S^(1-) 
• 1403964-79-3 C₁₂H₁₅OS⁽¹⁺⁾*C₁₇H₂₅F₂O₇S^(1-) 
• 1402933-09-8 C₁₂H₁₅OS⁽¹⁺⁾*C₁₃H₁₇F₂O₆S^(1-) 
• 1402933-08-7 C₁₂H₁₅OS⁽¹⁺⁾*C₁₃H₁₅F₂O₆S^(1-) 
• 1328506-34-8 C₅H₃F₂N₂O₄S^(1-)*C₁₂H₁₅OS⁽¹⁺⁾ 

Relevant academic research and scientific papers

Salt, resist composition and a manufacturing method of a resist pattern

The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C20 divalent saturated hydrocarbon group in which one or more —CH2— ca

SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN

A salt represented by formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which a methylene group may

PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN

A photoresist composition comprising (A) a resin which has an acid-labile group-containing structural unit and a lactone ring-containing structural unit, and(B) a salt represented by formula (I): wherein Q1 and Q2 each independently

SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN

A salt represented by formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, n represents 0 or 1, Ll represents a single bond or a C1-C10 alkanediyl group in which a me

SALT AND PROCESS FOR PRODUCING ACID GENERATOR

A salt represented by the formula (I0): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a divalent C1-C17 hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, m represents 1 or 2, and Zm+ represents m-valent organic or inorganic cation.