1311403-44-7Relevant academic research and scientific papers
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
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Paragraph 0219; 0220; 0223; 0227; 0228, (2019/05/15)
To provide a salt capable of producing a resist pattern with good line edge roughness.SOLUTION: The salt is represented by formula (I) [where Rand Reach represent an OH group or a group of formula (R-1); Qand Qeach represent an F atom or a perfluoroalkyl
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
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Paragraph 0207; 0208; 0211; 0215; 0216; 0217, (2019/05/21)
To provide a salt capable of producing a resist pattern with good line edge roughness (LER), and a resist composition containing the salt.SOLUTION: The salt is represented by formula (I) [where Rand Reach represent a hydroxy group or a group represented b
SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
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Paragraph 0248; 0252; 0253, (2019/07/25)
PROBLEM TO BE SOLVED: To provide a salt, an acid generator, a resin and a resist composition capable of producing a resist pattern with good line edge roughness. SOLUTION: The salt is represented by formula (I) [where Q1 and Q2 each
A salt, an acid generating agent, the composition and production of resist pattern (by machine translation)
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Paragraph 0227; 0231, (2018/02/24)
[A] producing a good resist pattern can be mask error factor (MEF) salt. [Solution] having a salt represented by formula (aa1) [in the formula (aa1), Xa X andb Is, independently, an oxygen atom or a sulfur atom. The ring W1/sup
Salt, the composition and production of resist pattern
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Paragraph 0132, (2018/03/01)
PROBLEM TO BE SOLVED: To provide a resist composition satisfying the line edge roughness (LER) of a resist pattern.SOLUTION: A salt is represented by formula (I), wherein Qand Qare each independently a fluorine atom or a 1-6C perfluoroalkyl group; Lis a d
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
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Paragraph 0235, (2018/04/11)
PROBLEM TO BE SOLVED: To provide a salt capable of producing a resist pattern with good CD uniformity (CDU), and a resist composition containing the salt. SOLUTION: The salt has a group represented by formula (aa1) [where Xa and Xb e
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
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Paragraph 0530; 0531; 0539, (2018/03/25)
A salt represented by formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, R1 and R2 independently each represent a hydrogen atom, a fluorine atom or a C1-
SALT, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
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Paragraph 0190, (2018/05/24)
PROBLEM TO BE SOLVED: To provide a salt that makes it possible to produce a resist pattern with good CD uniformity (CDU), a resist composition containing the same, and a method for producing a resist pattern. SOLUTION: A salt represented by formula (I), a
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
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Paragraph 0180; 0185; 0188, (2018/07/03)
PROBLEM TO BE SOLVED: To provide a resist composition capable of producing a resist pattern with a good mask error factor (MEF), and a method for producing a resist pattern. SOLUTION: A salt is represented by formula (I) [where QA1 and QA2
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
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Paragraph 0153; 0154; 0156, (2018/08/25)
PROBLEM TO BE SOLVED: To provide a salt capable of producing a resist pattern with good CD uniformity (CDU), a resist composition containing the same, and a method for producing a resist pattern. SOLUTION: The salt is represented by formula (I) [where Qs
