1422452-88-7

Upstream product

• 942619-42-3 C₂HF₂O₅S^(1-)*C₁₈H₁₅S⁽¹⁺⁾ 
• 1311403-44-7 C₅H₃F₂N₂O₄S^(1-)*C₁₈H₁₅S⁽¹⁺⁾ 
• 1379588-19-8 C₁₉H₂₅F₂O₉S^(1-)*C₁₈H₁₅S⁽¹⁺⁾ 
• 625122-38-5 2-chloroacetoxy-2-ethyladamantane 
• 1408289-77-9 C₁₆H₂₁F₂O₉S^(1-)*C₁₈H₁₅S⁽¹⁺⁾ 
• 56674-87-4 4-oxoadamantane-1-carboxylic acid 
• 1379588-15-4 C₁₄H₁₆N₂O₂ 
• 1379588-16-5 C₁₇H₂₄O₅ 
• 1379588-17-6 C₁₇H₂₆O₅ 

Relevant academic research and scientific papers

Salt, the composition and production of resist pattern

PROBLEM TO BE SOLVED: To provide a salt to be used for a resist composition that allows production of a resist pattern with excellent pattern collapse resistance.SOLUTION: The salt is expressed by the formula (I). In the formula, Qand Qrepresent a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms; Lrepresents a carbonyl group or -CF-; Xrepresents a single bond, a divalent saturated hydrocarbon group having 1 to 14 carbon atoms which may have a substituent, or a group expressed by formula (a-1); c is 0 or 1; and X, X, A, Aand Aeach represent a specified group.

SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN

A salt represented by formula (I): wherein Q1, Q2, L1, W, and Z+ are defined in the specification.