Welcome to LookChem.com Sign In|Join Free
  • or
methyl 9,10-dihydro-9,10-ethanoanthracene-11-carboxylate is a chemical with a specific purpose. Lookchem provides you with multiple data and supplier information of this chemical.

13294-86-5

Post Buying Request

13294-86-5 Suppliers

Recommended suppliers

  • Product
  • FOB Price
  • Min.Order
  • Supply Ability
  • Supplier
  • Contact Supplier

13294-86-5 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 13294-86-5 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,3,2,9 and 4 respectively; the second part has 2 digits, 8 and 6 respectively.
Calculate Digit Verification of CAS Registry Number 13294-86:
(7*1)+(6*3)+(5*2)+(4*9)+(3*4)+(2*8)+(1*6)=105
105 % 10 = 5
So 13294-86-5 is a valid CAS Registry Number.

13294-86-5SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 15, 2017

Revision Date: Aug 15, 2017

1.Identification

1.1 GHS Product identifier

Product name 9,10-dihydro-9,10-ethanoanthracene-12-carboxylic acid methyl ester

1.2 Other means of identification

Product number -
Other names methyl 9,10-ethanoanthracene-11-carboxylate

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:13294-86-5 SDS

13294-86-5Relevant academic research and scientific papers

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

-

Paragraph 0465; 0467; 0547, (2020/07/28)

A resist composition including a compound represented by formula (bd1), a total amount of the acid-generator component and the basic component being 20 to 70 parts by weight, relative to 100 parts by weight of the base material component (wherein Rx1 to Rx4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rx1 to Rx4 may be mutually bonded to form a ring structure; Ry1 and Ry2 represents a hydrogen atom or a hydrocarbon group, or Ry1 and Ry2 may be mutually bonded to form a ring structure; Rz1 to Rz4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rz1 to Rz4 may be mutually bonded to form a ring structure; provided that at least one of Rx1 to Rx4 , Ry1 , Ry2 and Rz1 to Rz4 has an anionic group; and Mm+ represents an m-valent organic cation).

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID GENERATOR

-

Paragraph 1147; 1261, (2019/12/06)

A resist composition containing a compound represented by the general formula (bd1-1), (bd1-2) or (bd1-3); in the formula, Rx1 to Rx4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure; Ry1 to Ry2 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, Rz1 to Rz4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure. At least one of Rx1 to Rx4, Ry1 to Ry2 and Rz1 to Rz4 has an anion group, M1m+ represents a sulfonium cation having a sulfonyl group, R001 to R003 each independently represent a monovalent organic group; provided that at least one of R001 to R003 is an organic group having an acid dissociable group; and M3m+ represents an m-valent organic cation having an electron-withdrawing group.

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID GENERATOR

-

Paragraph 0709, (2018/06/09)

A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid, and a compound (B1) having an anion moiety and a cation moiety and being represented by general formula (b1) (wherein R01 to R014 each independently represents a hydrogen atom or a hydrocarbon group which may have a substituent, or two or more of R01 to R014 may be mutually bonded to form a ring structure, provided that at least two of R01 to R014 are mutually bonded to form a ring structure, and at least one of R01 to R014 has an anion group, and the anion moiety as a whole forms an anion having a valency of n; n represents an integer of 1 or more; represents an integer of 1 or more; and Mm+ represents an organic cation having a valency of m).

Rhodium(I)-catalyzed intramolecular ene reaction of vinylidenecyclopropanes and alkenes for the formation of bicyclo[5.1.0]octylenes

Li, Wei,Yuan, Wei,Shi, Min,Hernandez, Erik,Li, Guigen

supporting information; experimental part, p. 64 - 67 (2010/03/03)

"Chemical Equation Presented" An efficient catalytic system for the intramolecular ene reaction of allene and alkene of diarylvinylidenecyclopropanes has been established. The reaction was achieved by using [RhCl(CO)2]2 as the cataly

Facile microwave-assisted synthesis of 9,10-dihydro-9,10-ethanoanthracene- 11-carboxylic acid methyl ester

Phutdhawong, Weerachai,Buddhasukh, Duang

, p. 1409 - 1412 (2007/10/03)

A facile, high yielding synthesis of 9,10-dihydro-9,10-ethano- anthracene-11-carboxylic acid methyl ester using a modified commercial domestic microwave oven is reported.

Deuterium isotope effects and product studies for the oxidation of N(ω)-allyl-L-arginine and N(ω)-allyl-N(ω)-hydroxy-L-arginine by neuronal nitric oxide synthase

Hah, Jung-Mi,Roman, Linda J.,Silverman, Richard B.

, p. 1931 - 1936 (2007/10/03)

The nitric oxide synthases (NOS), which require heme, tetrahydrobiopterin, FMN, FAD, and NADPH, catalyze the O2-dependent conversion of L-arginine to L-citrulline and nitric oxide. N(ω)-Allyl-L-arginine, a mechanism-based inactivator of neuronal NOS, also is a substrate, producing L-arginine, acrolein, and H2O (Zhang, H. Q.; Dixon, R. P.; Marletta, M. A.; Nikolic, D.; Van Breemen, R.; Silverman, R. B. J. Am. Chem. Soc. 1997, 119, 10888). Two possible mechanisms for this turnover are proposed, one initiated by allyl C-H bond cleavage and the other by guanidino N-H cleavage, and these mechanisms are investigated with the use of N(ω)-allyl-L-arginine (1), N(ω)-[1,1-2H2]allyl-L-arginine (7), N(ω)-allyl-N(ω)-hydroxy-L-arginine (2) and N(ω)-[1,1-2H2]allyl-N(ω)-hydroxy-L-arginine (8) as substrates. Significant isotope effects on the two kinetic parameters, k(cat) and k(cat)/K(m), are observed in case of 1 and 7 during turnover, but not with 2 and 8. No kinetic isotope effects are observed for either compound in their role as inactivators. These results support a mechanism involving initial C-H bond cleavage of N(ω)-allyl-L-arginine followed by hydroxylation and breakdown to products. Copyright (C) 2000.

Mechanistic aspects of the reaction of anionic iron(0)-olefin complexes with organic halides. detection and characterization of paramagnetic organometallic intermediates

Hill, Dale H.,Parvez, Masood A.,Sen, Ayusman

, p. 2889 - 2901 (2007/10/02)

The scope and the mechanism of the reactions of [CpFe(COD)][Li(TMEDA) (Cp = C5H5-; COD = 1,5-cyclooctadiene; TMEDA = Me2NCH2CH2NMe2), 1, with a number of organic monohalides and geminal dih

Reductive decarboxylation of N-(acyloxy)phthalimides via redox-initiated radical chain mechanism

Okada,Okubo,Morita,Oda

, p. 7377 - 7380 (2007/10/02)

Highly efficient reductive decarboxylation of N-(acyloxy)phthalimides which are readily prepared from carboxylic acids was achieved by visible light irradiation using Ru(bpy)3Cl2 as a sensitizer in the presence of BNAH and t-BuSH via radical chain mechanism.

Synthesis of δ-L-α-aminoadipoyl-L-cysteinyl- D-allylglycine, and eight deuterated analogues, substrates for the investigation of the mechanism of action of isopenicillin n synthase

Baldwin, Jack E.,Bradley, Mark,Turner, Nicholas J.,Adlington, Robert M.,Pitt, Andrew R.,Sheridan, Helen

, p. 8203 - 8222 (2007/10/02)

The synthesis of δ-L-α-aminoadipoyl-L-cysteinyl-D-allylglycine (1a) from its component amino acids is described, along with the synthesis of eight analogues (1b-i) specifically deuterated at C-3 and/or C-5 of the allyglycine residue.

Post a RFQ

Enter 15 to 2000 letters.Word count: 0 letters

Attach files(File Format: Jpeg, Jpg, Gif, Png, PDF, PPT, Zip, Rar,Word or Excel Maximum File Size: 3MB)

1 Customer Service

What can I do for you?
Get Best Price

Get Best Price for 13294-86-5