6624-25-5

Upstream product

• 120-12-7 anthracene 
• 107-02-8 acrolein 
• 141-78-6 ethyl acetate 
• 108-22-5 Isopropenyl acetate 
• 108-05-4 vinyl acetate 
• 86367-71-7 11-ethyl 9,10-dihydro-9,10-ethanoanthracene-11-carboxylate 
• 111373-40-1 C₂₃H₂₂O₄ 
• 111373-41-2 C₁₇H₁₄O₂ 
• 7673-68-9 C₁₇H₁₄O 
• 5434-63-9 9,10-dihydro-9,10-ethanoanthracene-11-carboxylic acid 
• 13294-86-5 methyl 9,10-dihydro-9,10-ethanoanthracene-11-carboxylate 

Downstream Products

• 7673-68-9 C₁₇H₁₄O 
• 4427-38-7 C₂₄H₂₂O₃S 
• 7673-68-9 dibenzobicyclo[2.2.2]octa-2,5-diene-7-carbaldehyde 

Relevant academic research and scientific papers

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

A resist composition including a compound represented by formula (bd1), a total amount of the acid-generator component and the basic component being 20 to 70 parts by weight, relative to 100 parts by weight of the base material component (wherein Rx1 to Rx4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rx1 to Rx4 may be mutually bonded to form a ring structure; Ry1 and Ry2 represents a hydrogen atom or a hydrocarbon group, or Ry1 and Ry2 may be mutually bonded to form a ring structure; Rz1 to Rz4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rz1 to Rz4 may be mutually bonded to form a ring structure; provided that at least one of Rx1 to Rx4 , Ry1 , Ry2 and Rz1 to Rz4 has an anionic group; and Mm+ represents an m-valent organic cation).

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID GENERATOR

A resist composition containing a compound represented by the general formula (bd1-1), (bd1-2) or (bd1-3); in the formula, Rx1 to Rx4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure; Ry1 to Ry2 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, Rz1 to Rz4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure. At least one of Rx1 to Rx4, Ry1 to Ry2 and Rz1 to Rz4 has an anion group, M1m+ represents a sulfonium cation having a sulfonyl group, R001 to R003 each independently represent a monovalent organic group; provided that at least one of R001 to R003 is an organic group having an acid dissociable group; and M3m+ represents an m-valent organic cation having an electron-withdrawing group.

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID GENERATOR

A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid, and a compound (B1) having an anion moiety and a cation moiety and being represented by general formula (b1) (wherein R01 to R014 each independently represents a hydrogen atom or a hydrocarbon group which may have a substituent, or two or more of R01 to R014 may be mutually bonded to form a ring structure, provided that at least two of R01 to R014 are mutually bonded to form a ring structure, and at least one of R01 to R014 has an anion group, and the anion moiety as a whole forms an anion having a valency of n; n represents an integer of 1 or more; represents an integer of 1 or more; and Mm+ represents an organic cation having a valency of m).

Roof shape amines: Synthesis and application as NMR chiral solvating agents for discrimination of α-functionalized acids We wish to dedicate this paper to Professor Sukh Dev on the occasion of his 90th birthday

A series of new chiral roof shape amines have been prepared from anthracene involving simple chemical steps and enzymatic resolution of isomers. The amines were screened as chiral solvating agents for the discrimination of enantiomers of several α-functionalized acids by the 1H NMR analysis. The system can also be used to accurately measure enantiomeric excess of mandelic acid by 1H NMR analysis. The roof shape CSAs were capable of detecting the shift in the signals for the standard four nuclei of 1H, 13C, 19F and 31P of various optically active acids.

Rhodium(I)-catalyzed intramolecular ene reaction of vinylidenecyclopropanes and alkenes for the formation of bicyclo[5.1.0]octylenes

"Chemical Equation Presented" An efficient catalytic system for the intramolecular ene reaction of allene and alkene of diarylvinylidenecyclopropanes has been established. The reaction was achieved by using [RhCl(CO)2]2 as the cataly

Use of bridged tricyclic amine derivatives as anti-ischemic agents

Certain bridged tricyclic amine compounds are described as being therapeutically effective in treatments of CNS disorders resulting from neurotoxic damage or neurodegenerative diseases, particularly those CNS disorders resulting from ischemic events. Compounds of particular interest for use as neuroprotective agents are those of the formula STR1 wherein each of R1 and R2 is independently selected from hydrido, loweralkyl, benzyl and phenyl; wherein each of R1 through R7 is independently selected from hydrido, loweralkyl, hydroxy, benzyl, phenyl, loweralkoxy, phenoxy, benzyloxy, halo and haloloweralkyl; wherein R18 may be selected from hydrido, loweralkyl, cycloalkyl of five or six carbon atoms, cycloalkylalkyl of six or seven carbon atoms, phenyl, hydroxyloweralkyl, and heteroaryl selected from saturated or fully unsaturated heterocyclic rings containing five to seven ring members of which one or two ring members are nitrogen atom; wherein each X is independently one or more groups selected from hydrido, hydroxy, loweralkyl, benzyl, phenyl, loweralkoxy, phenoxy, haloloweralkyl, halo, and lower-alkanoyl; and wherein each of R23 through R30 is independently selected from hydrido, lower alkyl, benzyl, phenyl and halo; wherein R18 together with one of R23, R24, R29 or R30 may form a fused heterocyclic ring containing five or six ring members; or a pharmaceutically-acceptable salt thereof.

Dihetero nitrogen-containing cycloheteroethanoanthracene derivatives as antipsychotic agents

A class of ethanoanthracene derivatives is described having use in treatment of CNS disorders such as psychotic, convulsive and dystonic disorders. Compounds of particular interest are those of the formula wherein each of R5 and R6 is independently selected from hydrido, loweralkyl, benzyl and phenyl; wherein each of R7 through R11 is independently selected from hydrido, loweralkyl, hydroxy, benzyl, phenyl, loweralkoxy, phenoxy, benzyloxy, halo and haloloweralkyl; wherein R12 may be selected from hydrido, loweralkyl, cycloalkyl of five or six carbon atoms, cycloalkylalkyl of six or seven carbon atoms, phenyl, hydroxyloweralkyl, and heteroaryl selected from saturated or fully unsaturated heterocyclic rings containing five to seven ring members of which one or two ring members are nitrogen atom; wherein each Y is independently one or more groups selected from hydrido, hydroxy, loweralkyl, benzyl, phenyl, loweralkoxy, phenoxy, haloloweralkyl, halo, and loweralkanoyl; and wherein each of R13 through R20 is independently selected from hydrido, lower alkyl, benzyl, phenyl and halo; wherein R12 together with one of R13, R14, R19 or R20 may form a fused heterocyclic ring containing five or six ring members; or a pharmaceutically-acceptable salt thereof.